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Volumn , Issue , 2008, Pages 455-459
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Cat-CVD deposited inverted μc-Si:H/c-Si heterojunction solar cell approach
a
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Author keywords
Catalytic CVD; Heterojunction; Microcrystalline silicon; Solar cells
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Indexed keywords
AUTOMATION;
BORON;
CHEMICAL VAPOR DEPOSITION;
CONTROL;
DOPING (ADDITIVES);
ELECTRICAL ENGINEERING;
ELECTRODEPOSITION;
HYDROGEN;
HYDROGENATION;
INFORMATION THEORY;
MICROCRYSTALLINE SILICON;
PHOTOVOLTAIC CELLS;
PROCESS CONTROL;
SEMICONDUCTING SILICON COMPOUNDS;
SILANES;
SOLAR CELLS;
SOLAR RADIATION;
SUBSTRATES;
SUN;
TUNGSTEN;
VOLATILE ORGANIC COMPOUNDS;
ACTIVE-AREA EFFICIENCIES;
BORON-DOPED;
BUFFER-LAYER;
CAT-CVD;
CATALYST TEMPERATURES;
CATALYTIC CHEMICAL VAPOR DEPOSITIONS;
CATALYTIC-CVD;
DEVICE QUALITIES;
DIBORANE;
HETEROJUNCTION SOLAR CELLS;
HYDROGENATED AMORPHOUS SILICONS;
HYDROGENATED MICROCRYSTALLINE SILICONS;
I-V CHARACTERISTICS;
LOW-SUBSTRATE TEMPERATURES;
NEW TECHNOLOGIES;
P-DOPING;
SI FILMS;
SOLAR SPECTRUM;
STRUCTURE CONFIGURATIONS;
SUBSTRATE TEMPERATURES;
TRANSPARENT CONDUCTING OXIDES;
AMORPHOUS SILICON;
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EID: 61549089038
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ICEEE.2008.4723442 Document Type: Conference Paper |
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Times cited : (3)
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References (20)
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