Liquid phase deposition of amorphous carbon and carbon nitride films

e-Journal of Surface Science and Nanotechnology

Volumn 7, Issue , 2009, Pages 102-106

  Kiyota, Hideo ^a   Gamo, Hidenori ^b   Nishitani Gamo, Mikka ^c   Ando, Toshihiro ^d  

^a TOKAI UNIVERSITY   (Japan)

^b TOPPAN PRINTING CO LTD   (Japan)

^c TOYO UNIVERSITY   (Japan)

^d NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Amorphous thin films; Carbon; Carbon nitride; Electrochemical methods; Field emission; Growth

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; BIAS VOLTAGE; CARBON; CARBON NITRIDE; DEPOSITION; ELECTROLYTES; FIELD EMISSION; GROWTH (MATERIALS); LIQUIDS; NITRIDES; NITROGEN; THIN FILMS;

AMORPHOUS CARBON (A-C); AMORPHOUS THIN FILMS; CARBON NITRIDE FILMS; ELECTROCHEMICAL METHODS; LIQUID DEPOSITION; LIQUID PHASE DEPOSITIONS (LPD); POSITIVE BIAS VOLTAGES; SPECIFIC SUBSTRATES;

CARBON FILMS;

EID: 61449181148     PISSN: None     EISSN: 13480391     Source Type: Journal    
DOI: 10.1380/ejssnt.2009.102     Document Type: Conference Paper

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