Metal organic chemical vapour deposited thin films of cobalt oxide prepared via cobalt acetylacetonate

Journal of Materials Science and Technology

Volumn 25, Issue 1, 2009, Pages 85-89

  Mordi, C U ^a   Eleruja, M A ^a   Taleatu, B A ^a   Egharevba, G O ^a   Adedeji, A V ^b   Akinwunmi, O O ^a   Olofinjana, B ^a   Jeynes, C ^c   Ajayi, E O B ^a  

^a OBAFEMI AWOLOWO UNIVERSITY   (Nigeria)

^b AUBURN UNIVERSITY   (United States)

^c UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

Metal organic chemical vapour deposition (MOCVD); Oxide; Precursor; Rutherford backscattering spectroscopy (RBS); Thin film

Indexed keywords

BACKSCATTERING; CHEMICAL VAPOR DEPOSITION; COBALT; CRACKING (CHEMICAL); DIAMOND FILMS; ELECTRODEPOSITION; FILM PREPARATION; INDUSTRIAL CHEMICALS; METALS; ORGANIC CHEMICALS; ORGANOMETALLICS; OXIDE FILMS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; THIN FILM DEVICES; THIN FILMS;

ACETYLACETONATE; AVERAGE GRAIN SIZES; COBALT OXIDES; COMPOSITIONAL CHARACTERIZATIONS; METAL ORGANIC; OPTICAL ABSORPTION SPECTROSCOPIES; PRECURSOR; RUTHERFORD BACKSCATTERING SPECTROSCOPY (RBS); SODA LIME GLASS SUBSTRATES; SOLID SOURCES; X-RAY DIFFRACTIONS;

ABSORPTION SPECTROSCOPY;

EID: 60949097353     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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