Curved microwell arrays created by diffusion-limited chemical etching of artificially engineered solids

Langmuir

Volumn 25, Issue 2, 2009, Pages 643-647

  Ma, Zeyu ^a,b   Hong, Yan ^a,b   Ma, Liyuan ^a   Ni, Yicun ^a   Zou, Shengli ^a   Su, Ming ^a,b  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b University of Central Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ETCHINGS; CONTROLLED SIZES; CONTROLLED STRUCTURES; DIFFUSION LIMITEDS; ETCHING PROCESS; GLASS COMPOSITES; GLASS MATERIALS; INORGANIC MATERIALS; MICROWELLS; MONTE CARLO SIMULATIONS; NANO-MANUFACTURING; ORDERED ARRAYS;

DIFFUSION; ETCHING; GLASS; MICROCHANNELS; MONTE CARLO METHODS;

POLYMER FILMS;

BOVINE SERUM ALBUMIN; DIMETICONE; GLASS; NANOPARTICLE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; DIFFUSION; METHODOLOGY; MICROARRAY ANALYSIS; MONTE CARLO METHOD; NANOTECHNOLOGY; PARTICLE SIZE;

DIFFUSION; DIMETHYLPOLYSILOXANES; GLASS; MEMBRANES, ARTIFICIAL; MICROARRAY ANALYSIS; MONTE CARLO METHOD; NANOPARTICLES; NANOTECHNOLOGY; PARTICLE SIZE; SERUM ALBUMIN, BOVINE;

EID: 60849139429     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la803343t     Document Type: Article

References (33)

1. Shevchenko, E. V.; Talapin, D. V.; Kotov, N. A.; O'Brien, S.; Murray, C. B. Nature 2006, 439, 55.
2. Xia, Y.; Whitesides, G. M. Annu. Rev. Mater. Sci. 1998, 28, 153.
3. Chen, T.; Zhang, Z.; Glotzer, S. C. Proc. Natl. Acad. Sci. U.S.A. 2007, 104, 717.
4. Murray, C. B.; Norris, D. J.; Bawendi, M. G. J. Am. Chem. Soc. 1993, 115, 8706.
5. Zarur, A. J.; Ying, J. Y. Nature 2000, 403, 65.
6. Bradley, J. S.; Hill, E. W.; Klein, C.; Duteil, A. Chem. Mater. 1993, 5, 254.
7. Yin, Y.; Rioux, R. M.; Erdonmez, C. K.; Hughes, S.; Somorjai, G. A.; Alivisatos, A. P. Science 2004, 304, 711.
8. Fan, H. J.; Gosele, U.; Zacharias, M. Small 2007, 3, 1660.
9. El-Sayed, M. A. Acc. Chem. Res. 2001, 34, 257.
10. Sun, Y.; Xia, Y. Science 2002, 298, 2176.
11. Chang, C.-Y.; Yang, S.-Y.; Chu, M.-H. Microelectron. Eng. 2007, 84, 355.
12. Moench, W.; Zappe, H. J. Opt. A: Pure Appl. Opt. 2004, 6, 330.
13. Barton, J. E.; Odom, T. W. Nano Lett. 2004, 4, 1525.
14. Khan, F.; Zhang, R.; Unciti-Broceta, A.; Diaz-Mochon, J. J.; Bradley, M. Adv. Mater. 2007, 19, 3524.
15. Pantano, P.; Walt, D. R. Chem. Mater. 1996, 8, 2832.
16. Gorris, H. H.; Blicharz, T. M.; Walt, D. R. FEBS J. 2007, 274.
17. Park, S.; Lim, J.-H.; Chung, S.-W.; Mirkin, C. A. Science 2004, 303, 348.
18. Shin, C. B.; Economou, D. J. J. Electrochem. Soc. 1989, 136, 1997.
19. Rath, P.; Chai, J. C.; Zheng, H.; Lam, Y. C.; Murukeshan, V. M. Int. J. Heat Mass Transfer 2006, 49, 3408.
20. D'Urso, B. R.; Simpson, J. T.; Kalyanaraman, M. Appl. Phys. Lett. 2007, 90, 44102.
21. Zhang, X.; Ma, Z.; Yuan, Z.-Y.; Su, M. Adv. Mater. 2008, 20, 1310.
22. Ma, Z.; Su, M. Adv. Mater. 2008, 20, 3734.
23. Tonucci, R. J.; Justus, B. L.; Campillo, A. J.; Ford, C. E. Science 1992, 258, 783.
24. Bayindir, M.; Shapira, O.; Saygin-Hinczewski, D.; Viens, J.; Abouraddy, A. F.; Joannopoulos, J. D.; Fink, Y. Nat. Mater. 2005, 4, 820.
25. Asherie, N. Methods 2004, 34, 266.
26. Tokimitsu, Y.; Kishi, H.; Kondo, S.; Honda, R.; Tajiri, K.; Motoki, K.; Ozawa, T.; Kadowaki, S.; Obata, T.; Fujiki, S.; Tateno, C.; Takaishi, H.; Chayama, K.; Yoshizato, K.; Tamiya, E.; Sugiyama, T.; Muraguchi, T. Cytometry 2007, 71A, 1003.
27. Chen, H. J. H.; Chen, T. F.; Huang, S. R. S.; Gong, J.; Li, J. C.; Chen, W. C.; Hseu, T. H.; Hsu, I. C. Sens. Actuators, A 2003, 108, 193.
28. Bernhard, D. D.; Mall, S.; Pantano, P. Anal. Chem. 2001, 73, 2484.
29. Srivannavit, O.; Gulari, M.; Gulari, E.; LeProust, E.; Pellois, J. P.; Gao, X.; Zhou, X. Sens. Actuators, A 2004, 116, 150.
30. Khademhosseini, A.; Yeh, J.; Eng, G.; Karp, J.; Kaji, H.; Borenstein, J.; Farokhzad, O. C.; Langer, R. Lab Chip 2005, 5, 1380.
31. Yang, S.; Aizenberg, J. Nanotoday 2005, December, 40.
32. Wang, L.; Lee, M. H.; Barton, J.; Hughes, L.; Odom, T. W. J. Am. Chem. Soc. 2008, 130, 2142.
33. Min, E.; Wong, K. H.; Wong, M. H.; Stenzel, M. H. Adv. Mater. 2008, early view.