Magnetic properties of CoWP film by electroless deposition

Journal of Alloys and Compounds

Volumn 471, Issue 1-2, 2009, Pages 515-518

  Ge, H L ^a   Chen, Q ^a   Li, L ^a   Wu, Q ^a   Jin, H X ^a   Wei, G Y ^a   Chu, N J ^a   Wang, X Q ^a  

^a CHINA JILIANG UNIVERSITY   (China)

Author keywords

CoWP; Magnetic films; Magnetic property; Microstructure

Indexed keywords

ALUMINA; COBALT; COBALT COMPOUNDS; COERCIVE FORCE; FILM PREPARATION; GRAIN BOUNDARIES; MAGNETIC DEVICES; MAGNETIC FILMS; MAGNETISM; METALLIC FILMS; MICROSTRUCTURE; SATURATION MAGNETIZATION; SURFACE TOPOGRAPHY;

ALKALINE SOLUTIONS; ALUMINUM SUBSTRATES; AMORPHOUS PHASE; CO PHASE; COWP; ELECTROLESS DEPOSITIONS; ELEMENT COMPOSITIONS; EXCHANGE-COUPLING EFFECTS; REMANENCE ENHANCEMENTS; XRD;

AMORPHOUS FILMS;

EID: 60849114441     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.04.010     Document Type: Article

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