Electrochemically driven sequential machines: An implementation of copper rotaxanes

Chemistry - A European Journal

Volumn 15, Issue 6, 2009, Pages 1310-1313

  Periyasamy, Ganga ^a   Collin, Jean Paul ^b   Sauvage, Jean Pierre ^b   Levine, Raphael D ^c   Remacle, Francoise ^a  

^a UNIVERSITY OF LIÈGE   (Belgium)

^b UNIVERSITÉ DE STRASBOURG   (France)

^c HEBREW UNIVERSITY OF JERUSALEM   (Israel)

Author keywords

Copper; Molecular devices; Molecular hysteresis; Rotaxanes; Set reset machines

Indexed keywords

HYSTERESIS; SEQUENTIAL MACHINES;

ANODIC CURRENTS; APPLIED POTENTIALS; FINITE STATE; FINITE-DIFFERENCE NUMERICAL METHODS; INITIAL STATE; LOGIC MACHINES; MEMORY UNITS; METAL OXIDATIONS; MOLECULAR DEVICES; MOLECULAR HYSTERESIS; REDOX SPECIES; ROTAXANES; SET-RESET MACHINES; TRANSITION TABLES;

COPPER;

EID: 60749108027     PISSN: 09476539     EISSN: 15213765     Source Type: Journal    
DOI: 10.1002/chem.200802249     Document Type: Article

References (34)

1. P. Raiteri, G. Bussi, C. S. Cucinotta, A. Credi, J. F. Stoddart, M. Parrinello, Angew. Chem. 2008, 120, 3592:
2. Angew. Chem. Int. Ed. 2008, 47, 3536.
3. B. Champin, P. Mobian, J. P. Sauvage, Chem. Soc. Rev. 2007, 36, 358.
4. Z. Kohavi, Switching and Finite Automata Theory, Tata McGraw-Hill, New Delhi. 2nd. ed., 1999.
5. M. M. Mano, C. R. Kime, Logic and Computer Design Fundamentals, Prentice Hall, Upper Saddle River. NJ, 4th ed., 2000.
6. F. Remade, R. D. Levine in Nanotechnology Vol. 4: Information Technology II (Ed.: R. Waser), Wiley, Weinheim. 2008, p. 213.
7. M. Klein, R. D. Levine, F. Remade. J. Appl. Phys. 2008, 104, 044509.
8. F. Remade, J. R. Heath, R. D. Levine. Proc. Natl. Acad. Sci. USA 2005, 102, 5653.
9. M. Sano, H. Taube, J. Am. Chem. Soc. 1991, 113, 2327.
10. Structure & Bonding, Vol. 99: Molecular Machines and Motors (Ed.: J. P. Sauvage), Springer, Berlin, 2001.
11. E. J. F. Stoddart, Acc. Chem. Res. 2001, 34.
12. V. Balzani, A. Credi, M. Venturi, Molecular Devices and Machines: A Journey into the Nano World, Wiley-VCH, Weinheim, 2008.
13. D. A. Leigh, M. A. F. Morales, E. M. Perez, J. K. Y. Wong, C. G. Saiz. A. M. Z. Slawin, A. J. Carmichael, D. M. Haddleton, A. M. Brouwer, W. J. Buma, G. W. H. Wurpel, S. Leon, F. Zerbetto,
14. Angew. Chem. 2005, 117, 3122;
15. Angew. Chem. Int. Ed. 2005, 44, 3062.
16. M. M. Pollard, M. Klok, D. Pijper, B. L. Feringa, Adv. Funct. Mater. 2007, 17, 718.
17. U. Letinois-Halbes, D. Hanss, J. M. Beierle, J. P. Collin, J. P. Sauvage, Org. Lett. 2005, 7, 5753.
18. I. Poleschak, J. M. Kern, J. P. Sauvage, Chem. Commun. 2004, 474.
19. K. Szacilowski. Chem. Rev. 2008, 108, 3481.
20. A. P. de Silva, S. Uchiyama, Nat. Nanotechnol. 2007, 2, 399.
21. I. Willner, B. Shlyahovsky, M. Zayats, B. Willner, Chem. Soc. Rev. 2008, 37, 1153.
22. F. Remacle, R. D. Levine, J. Chem. Phys. 2001, 114, 10239.
23. F. M. Raymo, M. Tomasulo, J. Phys. Chem. A 2005, 109, 7343.
24. R. Baron, A. Onopriyenko, E. Katz, O. Lioubashevski, I. Willner, W. Sheng, H. Tian, Chem. Commun. 2006, 2147.
25. D. Margulies, C. E. Felder, G. Melman, A. Shanzer, J. Am. Chem. Soc. 2007, 129, 347.
26. C. P. Collier, G. Mattersteig, E. W. Wong, Y. Luo, K. Beverly, J. Sampaio, F. M. Raymo, J. F. Stoddart, J. R. Heath, Science 2000, 289, 1172.
27. Y. Luo, C. P. Collier, J. O. Jeppesen, K. A. Nielsen, E. Delonno, G. Ho, J. Perkins, H. R. Tseng, T. Yamamoto, J. F. Stoddart, J. R. Heath, ChemPhysChem 2002, 3, 519.
28. J. E. Green, J. W. Choi, A. Boukai, Y. Bunimovich, E. Johnston-Halperin, E. Delonno, Y. Luo, B. A. Sheriff, K. Xu, Y. S. Shin, H. R. Tseng, J. F. Stoddart, J. R. Heath, Nature 2007, 445, 414.
29. A. J. Bard, L. R. Faulkner, Electrochemical Methods: Fundamentals and Applications, Wiley, New York. 2nd ed., 2001.
30. M. Orlik, J. Electroanal. Chem. 1997, 434, 139.
31. M. Orlik, J. Electroanal. Chem. 2005, 575, 281.
32. P. Kulkarni, S. Padhye, E. Sinn, Inorg. Chim. Acta 2001, 321, 193.
33. J. C. Vidal, A. Vera, J. R. Castillo, Anal. Sci. 1996, 12, 109.
34. L. Raehm, J. M. Kern, J. P. Sauvage, C. Hamann, S. Palacin, J. P. Bourgoin, Chem. Eur. J. 2002, 8, 2153.