Electrochemically controlled pitting corrosion in Ni film: A study of AFM and neutron reflectometry

Corrosion Science

Volumn 51, Issue 3, 2009, Pages 575-580

  Singh, Surendra ^a   Basu, Saibal ^a   Poswal, A K ^a   Tokas, R B ^a   Ghosh, S K ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

B. AFM; B. Neutron reflectometry; C. Ni film; C. Pitting corrosion

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHLORINE COMPOUNDS; NEUTRON DIFFRACTION; NEUTRON REFLECTION; NICKEL; REFLECTION; REFLECTOMETERS; SULFURIC ACID;

ATOMIC-FORCE MICROSCOPIES; B. AFM; B. NEUTRON REFLECTOMETRY; C. NI FILM; C. PITTING CORROSION; CHLORIDE SOLUTIONS; DENSITY PROFILES; DEPTH PROFILES; ELECTROCHEMICAL BEHAVIORS; PITTING POTENTIALS; SCATTERING LENGTH DENSITIES; SI SUBSTRATES; SPECULAR NEUTRON REFLECTIVITIES; SULFURIC ACID SOLUTIONS; THICKNESS OF FILMS; VOID NETWORKS;

PITTING;

EID: 60549086742     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.corsci.2008.12.017     Document Type: Article

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