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Volumn 94, Issue 3, 2009, Pages 393-398
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Post-growth tailoring of quantum-dot saturable absorber mirrors by chemical etching
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Author keywords
[No Author keywords available]
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Indexed keywords
CAVITY RESONATORS;
ETCHING;
FIBER LASERS;
GROWTH (MATERIALS);
MODULATION;
NEODYMIUM LASERS;
PRECISION ENGINEERING;
PULSED LASER APPLICATIONS;
REFLECTION;
RESONANCE;
SEMICONDUCTOR GROWTH;
SEMICONDUCTOR MATERIALS;
SEMICONDUCTOR QUANTUM DOTS;
TRANSFER MATRIX METHOD;
TUNING;
CAVITY RESONANCES;
CHEMICAL ETCHINGS;
DESIGN WAVELENGTHS;
DEVICE PROPERTIES;
INTENSITY DEPENDENTS;
MODULATION DEPTHS;
NANOMETRE;
NORMAL INCIDENCES;
OUTPUT POWER;
PASSIVELY MODE-LOCKED;
PULSE DURATIONS;
QUANTUM DOTS;
REFLECTIVITY MEASUREMENTS;
SATURABLE ABSORBER MIRRORS;
SATURATION FLUENCE;
SELF-STARTING;
SEMICONDUCTOR SATURABLE ABSORBER MIRRORS;
TEMPORAL WIDTHS;
TRANSFER MATRIX APPROACHES;
MIRRORS;
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EID: 59449084218
PISSN: 09462171
EISSN: None
Source Type: Journal
DOI: 10.1007/s00340-008-3319-5 Document Type: Article |
Times cited : (9)
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References (18)
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