Influence of atmospheric fluorine plasma treatment on thermal and dielectric properties of polyimide film

Journal of Colloid and Interface Science

Volumn 332, Issue 1, 2009, Pages 246-250

  Park, Soo Jin ^a   Sohn, Hee Jin ^b   Hong, Sung Kwon ^b   Shin, Gwi Su ^c  

^a Inha University   (South Korea)

^b Chungnam National University   (South Korea)

^c Jeonbuk Regional Innovation Agency   (South Korea)

Author keywords

Atmospheric fluorine plasma treatment; Contact angle measurement; Dielectric characteristics; Polyimide

Indexed keywords

ACTIVE SITES; ATMOSPHERIC FLUORINE PLASMA TREATMENT; CONTACT ANGLE MEASUREMENT; DIELECTRIC CHARACTERISTICS; DIELECTRIC CONSTANTS; ELECTRONIC-POLARIZABILITY; PLASMA EXPOSURES; PLASMA TREATMENTS; POLY-IMIDE FILMS; POLYIMIDE; POLYIMIDE THIN FILMS; STRUCTURAL MODIFICATIONS; THERMAL STABILITIES; X-RAY PHOTOELECTRON SPECTROSCOPIES;

ANGLE MEASUREMENT; CERAMIC CAPACITORS; CONTACT ANGLE; DIELECTRIC PROPERTIES; FLUORINE; FOURIER TRANSFORMS; FUNCTIONAL GROUPS; PHOTOELECTRON SPECTROSCOPY; PLASMA APPLICATIONS; PLASMAS; POLYIMIDES; POLYMERS; SURFACE PROPERTIES; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

NEMATIC LIQUID CRYSTALS;

FLUORINE; POLYIMIDE;

ARTICLE; ATMOSPHERE; DIELECTRIC CONSTANT; FILM; INFRARED SPECTROSCOPY; PRIORITY JOURNAL; THERMOSTABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 59349111853     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2008.12.040     Document Type: Article

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