Photobleaching resistance of stimulated parametric emission in microscopy

Optics Letters

Volumn 34, Issue 3, 2009, Pages 304-306

  Liu, Xuejun ^a   Rudolph, Wolfgang ^a   Thomas, James L ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMOPHORES; FLUORESCENCE; FLUORESCENCE MICROSCOPY; FLUOROPHORES; FOUR WAVE MIXING; PHOTOBLEACHING; TWO PHOTON PROCESSES;

FLUORESCENT LABELS; FOUR-WAVE-MIXING PROCESS; IMAGING CAPABILITIES; NONFLUORESCENT CHROMOPHORES; NONLINEAR MICROSCOPY; NONLINEAR OPTICAL SIGNALS; ORGANIC FLUOROPHORES; TWO PHOTON ABSORPTION;

NONLINEAR OPTICS;

ALGORITHM; ARTICLE; BIOLOGICAL MODEL; BLEACHING; COMPUTER ASSISTED DIAGNOSIS; COMPUTER SIMULATION; EVALUATION; FLUORESCENCE MICROSCOPY; FLUORESCENCE RECOVERY AFTER PHOTOBLEACHING; IMAGE ENHANCEMENT; METHODOLOGY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY;

ALGORITHMS; COMPUTER SIMULATION; FLUORESCENCE RECOVERY AFTER PHOTOBLEACHING; IMAGE ENHANCEMENT; IMAGE INTERPRETATION, COMPUTER-ASSISTED; MICROSCOPY, FLUORESCENCE; MODELS, BIOLOGICAL; PHOTOBLEACHING; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY;

EID: 59249097193     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.34.000304     Document Type: Article

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