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Volumn 83, Issue 6, 2009, Pages 996-1000
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The effect of WO3 source stability on the properties of films deposited by electron beam deposition
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Author keywords
Coloration efficiencies; Electron beam deposition; Thin films; Tungsten oxide; WO3 incorporated carbon nanotubes
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Indexed keywords
CHEMICAL MODIFICATION;
DEPOSITION;
ELECTRODEPOSITION;
ELECTRON BEAMS;
ELECTRON GUNS;
ELECTRONS;
NANOCOMPOSITES;
NANOTUBES;
OXIDE FILMS;
OXIDES;
PARTICLE BEAMS;
THIN FILMS;
TUNGSTEN;
TUNGSTEN COMPOUNDS;
VACUUM;
VACUUM DEPOSITION;
ABSORBANCE;
AS-DEPOSITED FILMS;
CARBON IMPURITIES;
COLORATION EFFICIENCIES;
CRYSTALLINITY;
DEPOSITED FILMS;
ELECTRON BEAM DEPOSITION;
GRAIN SIZES;
HIGH TEMPERATURE (HT);
TUNGSTEN OXIDE;
WO3-INCORPORATED CARBON NANOTUBES;
CARBON NANOTUBES;
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EID: 58749085181
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.vacuum.2008.11.012 Document Type: Article |
Times cited : (5)
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References (17)
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