메뉴 건너뛰기




Volumn 83, Issue 6, 2009, Pages 996-1000

The effect of WO3 source stability on the properties of films deposited by electron beam deposition

Author keywords

Coloration efficiencies; Electron beam deposition; Thin films; Tungsten oxide; WO3 incorporated carbon nanotubes

Indexed keywords

CHEMICAL MODIFICATION; DEPOSITION; ELECTRODEPOSITION; ELECTRON BEAMS; ELECTRON GUNS; ELECTRONS; NANOCOMPOSITES; NANOTUBES; OXIDE FILMS; OXIDES; PARTICLE BEAMS; THIN FILMS; TUNGSTEN; TUNGSTEN COMPOUNDS; VACUUM; VACUUM DEPOSITION;

EID: 58749085181     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.11.012     Document Type: Article
Times cited : (5)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.