Structural and optical properties of Ga 2(1-x) In 2x O 3 films prepared on α-Al 2 O 3 (0 0 0 1) by MOCVD

Applied Surface Science

Volumn 255, Issue 8, 2009, Pages 4401-4404

  Yang, Fan ^a   Ma, Jin ^a   Luan, Caina ^a   Kong, Lingyi ^a  

^a SHANDONG UNIVERSITY   (China)

Author keywords

Ga 2(1 x) In 2x O 3 films; Microstructure; MOCVD; Optical properties

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ENERGY GAP; INDIUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; OPTICAL PROPERTIES; ORGANIC CHEMICALS; ORGANOMETALLICS; THIN FILMS;

A3. METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); ATOMIC RATIO; INDIUM CONTENT; MICROSTRUCTURE ANALYSIS; POLYCRYSTALLINE STRUCTURE; SINGLE-CRYSTALLINE STRUCTURES; STRUCTURAL AND OPTICAL PROPERTIES; VISIBLE RANGE;

FILM PREPARATION;

EID: 58349108872     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.10.129     Document Type: Article

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