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Journal of Physics Condensed Matter

Volumn 20, Issue 45, 2008, Pages

Photoresist-buffer-enhanced antiferromagnetic coupling and the giant magnetoresistance effect of Co/Cu multilayers

(6) Chen, Yuan Fu a Mei, Yongfeng a Malachias, Angelo a Ingolf Mönch, Jens a Kaltofen, Rainer a Schmidt, Oliver G a

a IFW DRESDEN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROELECTRICITY; ANTIFERROMAGNETIC MATERIALS; ANTIFERROMAGNETISM; ELECTRIC RESISTANCE; HYSTERESIS; HYSTERESIS LOOPS; KERR MAGNETOOPTICAL EFFECT; MAGNETIC FIELD EFFECTS; MAGNETIC MATERIALS; MAGNETIC RECORDING; MAGNETOELECTRONICS; MAGNETOOPTICAL EFFECTS; MAGNETORESISTANCE; MULTILAYERS; OPTICAL KERR EFFECT; OPTICAL MULTILAYERS; OPTICAL PROPERTIES; PHOTORESISTORS; PHOTORESISTS; SURFACE ROUGHNESS; SURFACE TREATMENT;

[CO/CU]; ANTIFERROMAGNETIC COUPLINGS; BI LAYERS; CO/CU MULTILAYERS; GIANT MAGNETORESISTANCE EFFECTS; INTERFACIAL ROUGHNESSES; PHOTORESIST LAYERS; SI SUBSTRATES; X-RAY REFLECTIVITIES;

GIANT MAGNETORESISTANCE;

EID: 58149354548 PISSN: 09538984 EISSN: 1361648X Source Type: Journal
DOI: 10.1088/0953-8984/20/45/452202 Document Type: Article

Times cited : (7)

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