Fluence-dependent formation of Zn and ZnO nanoparticles by ion implantation and thermal oxidation: An attempt to control nanoparticle size

Journal of Applied Physics

Volumn 104, Issue 11, 2008, Pages

  Amekura, H ^a   Ohnuma, M ^a   Kishimoto, N ^a   Buchal, Ch ^b   Mantl, S ^b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

GAS ABSORPTION; ION BOMBARDMENT; ION IMPLANTATION; NANOPARTICLES; OXIDATION; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCATTERING; SEMICONDUCTING ZINC COMPOUNDS; SILICA; X RAY SCATTERING; ZINC; ZINC OXIDE;

BRANCHING RATIOS; FLUENCE; FLUENCES; IMPLANTED STATES; MEAN DIAMETERS; NANOPARTICLE SIZES; NUMBER DENSITIES; OPTICAL ABSORPTION SPECTROSCOPIES; OXYGEN GASSES; RUTHERFORD BACKSCATTERINGS; SIZE CONTROLS; THERMAL ANNEALING; THERMAL OXIDATIONS; UPPER LIMITS; VOLUME RATIOS; ZNO NANOPARTICLES;

ABSORPTION SPECTROSCOPY;

EID: 58149270811     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3014032     Document Type: Article

References (22)

1. U. Ozgur, Y. I. Alivov, C. Liu, A. Teke, M. A. Reschikov, S. Dogan, V. Avrutin, S. -J. Cho, and H. Morkoc, J. Appl. Phys. 0021-8979 10.1063/1.1992666 98, 041301 (2005).
2. H. Cao, Y. G. Zhao, S. T. Ho, E. W. Seelig, Q. H. Wang, and R. P. H. Cheng, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.82.2278 82, 2278 (1999).
3. M. Kawasaki, A. Ohtomo, I. Ohkubo, H. Koinuma, Z. K. Tang, P. Yu, G. K. L. Wong, B. P. Zhang, and Y. Segawa, Mater. Sci. Eng., B 0921-5107 10.1016/S0921-5107(98)00248-7 56, 239 (1998).
4. Y. X. Liu, Y. C. Liu, D. Z. Shen, G. Z. Zhong, X. W. Fan, X. G. Kong, R. Mu, and D. O. Henderson, J. Cryst. Growth 0022-0248 10.1016/S0022-0248(02)00843- 6 240, 152 (2002).
5. H. Amekura, Y. Takeda, K. Kono, H. Kitazawa, and N. Kishimoto, Rev. Adv. Mater. Sci. 5, 178 (2003).
6. H. Amekura, N. Umeda, Y. Sakuma, N. Kishimoto, and Ch. Buchal, Appl. Phys. Lett. 0003-6951 10.1063/1.1989442 87, 013109 (2005).
7. H. Amekura, N. Umeda, Y. Sakuma, O. A. Plaksin, Y. Takeda, N. Kishimoto, and Ch. Buchal, Appl. Phys. Lett. 0003-6951 10.1063/1.2193327 88, 153119 (2006).
8. H. Amekura, Y. Takeda, and N. Kishimoto, Nucl. Instrum. Methods Phys. Res. B 0168-583X 10.1016/j.nimb.2004.01.003 222, 96 (2004).
9. L. R. Doolittle, Nucl. Instrum. Methods Phys. Res. B 0168-583X 10.1016/0168-583X(86)90291-0 15, 227 (1986).
10. J. F. Ziegler, J. P. Biersack, and U. Littmark, The Stopping and Range of Ions in Solids (Pergamon, New York, 1985).
11. W. Möller and W. Eckstein, Nucl. Instrum. Methods Phys. Res. B 0168-583X 10.1016/0168-583X(84)90321-5 2, 814 (1984).
12. E. Snoeks, T. Weber, A. Cacciato, and A. Polman, J. Appl. Phys. 0021-8979 10.1063/1.359820 78, 4723 (1995).
13. T. van Dillen, A. Polman, C. M. van Kats, and A. van Blaaderen, Appl. Phys. Lett. 0003-6951 10.1063/1.1629793 83, 4315 (2003).
14. H. Amekura and N. Kishimoto, J. Appl. Phys. 104, 063509 (2008).
15. J. S. Pedersen, J. Appl. Crystallogr. 0021-8898 10.1107/S0021889893013810 27, 595 (1994).
16. E. Brosh and A. Kiv, J. Nucl. Mater. 0022-3115 10.1016/S0022-3115(02) 01307-7 306, 173 (2002).
17. K. Nozawa, M. -H. Delville, H. Ushiki, P. Panizza, and J. -P. Delville, Phys. Rev. E 1063-651X 10.1103/PhysRevE.72.011404 72, 011404 (2005).
18. G. Rizza, Y. Ramjauny, T. Gacoin, L. Vieille, and S. Henry, Phys. Rev. B 0163-1829 10.1103/PhysRevB.76.245414 76, 245414 (2007).
19. H. Amekura (unpublished).
20. H. Amekura, K. Kono, N. Kishimoto, and Ch. Buchal, Nucl. Instrum. Methods Phys. Res. B 0168-583X 10.1016/j.nimb.2005.08.019 242, 96 (2006).
21. H. Amekura, N. Umeda, M. Yoshitake, K. Kono, N. Kishimoto, and Ch. Buchal, J. Cryst. Growth 0022-0248 10.1016/j.jcrysgro.2005.10.032 287, 2 (2006).
22. H. Chang, H. D. Park, K. S. Sohn, and J. D. Lee, J. Korean Phys. Soc. 34, 545 (1999).