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Volumn 8, Issue 11, 2008, Pages 6010-6016
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Comparison between the electrical properties of ZnO nanowires based field effect transistors fabricated by back- and top-gate approaches
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Author keywords
Back and top gate; Field Effect Transistors (FETs); ZnO nanowires
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Indexed keywords
BACK- AND TOP-GATE;
ELECTRICAL PROPERTIES;
FIELD EFFECTS;
METALLIC ZINC POWDERS;
PHOTOLITHOGRAPHY PROCESSES;
SILICON SUBSTRATES;
SINGLE NANOWIRES;
SOURCE MATERIALS;
ZNO NANOWIRES;
DIELECTRIC RELAXATION;
ELECTRIC PROPERTIES;
ELECTRIC WIRE;
ELECTRON BEAM LITHOGRAPHY;
ELECTRON BEAMS;
FABRICATION;
GROWTH (MATERIALS);
MATERIALS PROPERTIES;
MESFET DEVICES;
NANOWIRES;
OXYGEN;
SEMICONDUCTING ZINC COMPOUNDS;
THERMAL EVAPORATION;
TRANSISTORS;
ZINC;
ZINC OXIDE;
FIELD EFFECT TRANSISTORS;
NANOTUBE;
ZINC OXIDE;
ARTICLE;
CHEMISTRY;
COMPARATIVE STUDY;
CONFORMATION;
CRYSTALLIZATION;
ELECTRIC CONDUCTIVITY;
EQUIPMENT;
EQUIPMENT DESIGN;
EVALUATION;
INSTRUMENTATION;
MACROMOLECULE;
MATERIALS TESTING;
METHODOLOGY;
MICROELECTRODE;
NANOTECHNOLOGY;
PARTICLE SIZE;
SEMICONDUCTOR;
SURFACE PROPERTY;
ULTRASTRUCTURE;
CRYSTALLIZATION;
ELECTRIC CONDUCTIVITY;
EQUIPMENT DESIGN;
EQUIPMENT FAILURE ANALYSIS;
MACROMOLECULAR SUBSTANCES;
MATERIALS TESTING;
MICROELECTRODES;
MOLECULAR CONFORMATION;
NANOTECHNOLOGY;
NANOTUBES;
PARTICLE SIZE;
SURFACE PROPERTIES;
TRANSISTORS;
ZINC OXIDE;
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EID: 58149242313
PISSN: 15334880
EISSN: None
Source Type: Journal
DOI: 10.1166/jnn.2008.478 Document Type: Article |
Times cited : (10)
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References (35)
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