Spray deposition and characterization of nanostructured Li doped NiO thin films for application in dye-sensitized solar cells

Nanotechnology

Volumn 19, Issue 48, 2008, Pages

  Paul Joseph, D ^a   Saravanan, M ^a   Muthuraaman, B ^a   Renugambal, P ^a   Sambasivam, S ^b   Philip Raja, S ^a   Maruthamuthu, P ^a   Venkateswaran, C ^a  

^a UNIVERSITY OF MADRAS   (India)

^b SRI VENKATESWARA UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CHLORINE COMPOUNDS; CONDUCTIVE FILMS; DOPING (ADDITIVES); ELECTRIC RESISTANCE; OPTICAL MICROSCOPY; PHOTOELECTROCHEMICAL CELLS; PHOTOVOLTAIC CELLS; SCANNING ELECTRON MICROSCOPY; SOLAR CELLS; SOLAR ENERGY; SOLAR EQUIPMENT; SOLIDS; THIN FILM DEVICES; THIN FILMS; TRANSPORT PROPERTIES; X RAY ANALYSIS;

ATOMIC FORCES; DYE-SENSITIZED SOLAR CELLS; FIGURE OF MERITS; GLASS SUBSTRATES; LITHIUM CHLORIDES; NANOSTRUCTURED; NICKEL NITRATES; NIO THIN FILMS; OPTICAL-; PREFERENTIAL GROWTHS; PROBE RESISTIVITIES; PYROLYTIC DECOMPOSITIONS; RESISTANCE VALUES; RESISTIVITY DATUMS; SPECTRAL TRANSMITTANCES; SPRAY DEPOSITIONS; TEMPERATURE DEPENDENTS; TRANSPARENT CONDUCTING; X-RAY DIFFRACTIONS;

LITHIUM;

DYE; GLASS; LITHIUM CHLORIDE; NANOCOATING; NANOMATERIAL; NICKEL; NITRATE;

AEROSOL; AIR; ARTICLE; ATOMIC FORCE MICROSCOPY; CELL; DECOMPOSITION; ENERGY; FILM; OPTICS; PHOTOLUMINESCENCE; PRECURSOR; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; X RAY DIFFRACTION;

EID: 58149229408     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/48/485707     Document Type: Article

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