Catalytic growth of boron nitride nanotubes using gas precursors

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 41, Issue 3, 2009, Pages 448-453

  Guo, L ^a   Singh, R N ^a  

^a UNIVERSITY OF CINCINNATI   (United States)

Author keywords

Boron nitride nanotubes (BNNTs); Catalyst; Chemical vapor deposition (CVD); Low temperature; Plasma

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BORON; BORON NITRIDE; CARBON NANOTUBES; CATALYSIS; COBALT; FILM GROWTH; GAS MIXTURES; GROWTH (MATERIALS); LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MICROSCOPES; MICROWAVES; NANOTUBES; NITRIDES; PLASMA DEPOSITION; PLASMAS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SPECTRUM ANALYSIS; STRUCTURAL PROPERTIES; SUBSTRATES; TRANSITION METALS; TRANSMISSION ELECTRON MICROSCOPY; VAPORS;

BORON NITRIDE NANOTUBES (BNNTS); CATALYST FILM THICKNESSES; CATALYTIC GROWTHS; ENERGY DISPERSIVE; GAS PRECURSORS; HEXAGONAL BORON NITRIDES; LOW TEMPERATURE; MICROWAVE PLASMAS; OPTIMUM COMBINATIONS; PATTERNED GROWTHS; PRECURSOR GASSES; SCANNING ELECTRON MICROSCOPES; SELECTED AREA DIFFRACTIONS; SUBSTRATE TEMPERATURES; TRANSMISSION ELECTRON MICROSCOPES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 58149161705     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2008.09.009     Document Type: Article

References (22)

1. Chopra N.G., Luyken R.J., Cherrey K., Crespi V.H., Cohen M.L., Louie S.G., and Zettl A. Science 269 (1995) 966
2. Chopra N.G., and Zettl A. Solid State Commun. 105 (1998) 297
3. Chen Y., Zou J., Campbell S.J., and Le Caer G. Appl. Phys. Lett. 84 (2004) 2430
4. Chang C.W., Han W., and Zettl A. Appl. Phys. Lett. 86 (2005) 173102
5. Cumings J., and Zettl A. Solid State Commun. 129 (2004) 661
6. Suryavanshi A.P., Yu M., Wen J., Tang C., and Bando Y. Appl. Phys. Lett. 84 (2004) 2527
7. Golberg D., Xu F., and Bando Y. Appl. Phys. A 76 (2003) 479
8. Golberg D., Bando Y., Eremets M., Takemura K., Kurashima K., and Yusa H. Appl. Phys. Lett. 69 (1996) 2045
9. Han W., Bando Y., Kurashima K., and Sato T. Appl. Phys. Lett. 73 (1998) 3085
10. Lourie O.R., Jones C.R., Bartlett B.M., Gibbons P.C., Ruoff R.S., and Buhro W.E. Chem. Mater. 12 (2000) 1808
11. Chen Y., Fitz Gerald J., Williams J.S., and Bulcock S. Chem. Phys. Lett. 299 (1999) 260
12. Wang J., Kayastha V.K., Yap Y.K., Fan Z., Lu J.G., Pan Z., Ivanov I.N., Puretzky A.A., and Geohegan D.B. Nano Lett. 5 (2005) 2528
13. Wang X.Z., Wu Q., Hu Z., and Chen Y. Electrochim. Acta 52 (2007) 2841
14. Guo L., and Singh R.N. Nanotechnology 19 (2008) 065601
15. Guo L., Shanov V., and Singh R.N. Ceram. Trans. 159 (2005) 177
16. Yuzuriha T.H., Mlynko W.E., and Hess D.W. J. Vac. Sci. Technol. A 3 (1985) 2135
17. Golberg D., Han W., Bando Y., Bourgeois L., Kurashima K., and Sato T. J. Appl. Phys. 86 (1999) 2364
18. Gogotsi Y. Nanomaterials Handbook (2006), Taylor & Francis Group LLC, Boca Raton
19. Aleixandre C.G., Essafti A., Fernandez M., Fierro J.L.G., and Albella J.M. J. Phys. Chem. 100 (1996) 2148
20. Wagner R.S., and Ellis W.C. Appl. Phys. Lett. 4 (1964) 89
21. Rodriguez J.A., Truong C.M., Corneille J.S., and Goodman D.W. J. Phys. Chem. 96 (1992) 334
22. Grunze M., Brundle C.R., and Tománek D. Surf. Sci. 119 (1982) 133