Selective growth of boron nitride nanotubes by plasma-enhanced chemical vapor deposition at low substrate temperature

Nanotechnology

Volumn 19, Issue 6, 2008, Pages

  Guo, L ^a   Singh, R N ^a  

^a UNIVERSITY OF CINCINNATI   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON NITRIDE; DECOMPOSITION; GAS MIXTURES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

BORON NITRIDE NANOTUBES; MICROWAVE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM (MPCVD); SUBSTRATE TEMPERATURE;

NANOTUBES;

BORON NITRIDE NANOTUBE; CARBON NANOTUBE; NANOMATERIAL; NICKEL;

ARTICLE; DECOMPOSITION; HYDROGEN BOND; MASS SPECTROMETRY; NANOTECHNOLOGY; PRIORITY JOURNAL; RAMAN SPECTROMETRY; SCANNING ELECTRON MICROSCOPY; SYNTHESIS; VAPOR;

EID: 43049105399     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/6/065601     Document Type: Article

References (26)

1. Rubio A, Corkill J L and Cohen M L 1994 Phys. Rev. B 49 5081
2. Chopra N G, Luyken R J, Cherrey K, Crespi V H, Cohen M L, Louie S G and Zettl A 1995 Science 269 966
3. Blase X, Rubio A, Louie S G and Cohen M L 1994 Europhys. Lett. 28 335
4. Chopra N G and Zettl A 1998 Solid State Commun. 105 297
5. Chen Y, Zou J, Campbell S J and Caer G L 2004 Appl. Phys. Lett. 84 2430
6. Chang C W, Han W and Zettl A 2005 Appl. Phys. Lett. 86 173102
7. Cumings J and Zettl A 2004 Solid State Commun. 129 661
8. Suryavanshi A P, Yu M, Wen J, Tang C and Bando Y 2004 Appl. Phys. Lett. 84 2527
9. Golberg D, Xu F F and Bando Y 2003 Appl. Phys. A 76 479
10. Golberg D, Bando Y, Eremets M, Takemura K, Kurashima K and Yusa H 1996 Appl. Phys. Lett. 69 2045
11. Han W, Bando Y, Kurashima K and Sato T 1998 Appl. Phys. Lett. 73 3085
12. Lourie O R, Jones C R, Bartlett B M, Gibbons P C, Ruoff R S and Buhro W E 2000 Chem. Mater. Commun. 12 1808
13. Chen Y, Gerald J F, Williams J S and Bulcock S 1999 Chem. Phys. Lett. 299 260
14. Wagner R S and Ellis W C 1964 Appl. Phys. Lett. 4 89
15. Guo L, Shanov V and Singh R N 2005 Ceram. Trans. 159 177
16. Aleixandre C G, Essafti A, Fernandez M, Fierro J L G and Albella J M 1996 J. Phys. Chem. 100 2148
17. Rand M J and Roberts J F 1968 J. Electrochem. Soc. 115 423
18. Cheng H 1995 J. Appl. Phys. 78 4633
19. Griem H R 1964 Plasma Spectroscopy 1st edn (New York: McGraw Hill) p 269
20. Chen Y, Chadderton L T, Gerald J F and Williams J S 1999 Appl. Phys. Lett. 74 2960
21. Chen Y, Conway M, Williams J S and Zou J 2002 J. Mater. Res. 17 1896
22. Chadderton L T and Chen Y 2002 J. Cryst. Growth 240 164
23. Buffat P and Borel J P 1976 Phys. Rev. A 13 2287
24. Goldstein A N, Echer C M and Alivisatos A P 1992 Science 256 1425
25. Zhu Y Q, Jin Y Z, Kroto H W and Walton D R M 2004 J. Mater. Chem. 14 685
26. Yuzuriha T H, Mlynko W E and Hess D W 1985 J. Vac. Sci. Technol. A 3 2135