Rapid prototyping of integrated microfluidic devices for combined radiation detection and plasma separation

1st Microsystems and Nanoelectronics Research Conference, MNRC 2008 - Enabling Synergy and Accelerating Excellence in Graduate Student Research

Volumn , Issue , 2008, Pages 105-108

  Convert, L ^a   Aimez, V ^a   Charette, P ^a   Lecomte, R ^b  

^a UNIVERSITÉ DE SHERBROOKE   (Canada)

^b UNIVERSITY OF SHERBROOKE   (Canada)

Author keywords

Glass etch; KMPR photoresist; Microfluidic; p i n photodiode; Rapid prototyping

Indexed keywords

CONCURRENT ENGINEERING; DETECTORS; JOB ANALYSIS; MICROSYSTEMS; NANOELECTRONICS; PHOTODIODES; PHOTORESISTORS; PLASMAS; RAPID PROTOTYPING; SEPARATION; SURFACE TREATMENT;

AUTO FLUORESCENCES; ETCHING PROCESSES; FLUORESCENT BEADS; GLASS COVERS; HIGH PRESSURES; HIGH SENSITIVITIES; INTEGRATED MICROFLUIDIC DEVICES; KMPR PHOTORESIST; LAB ON CHIPS; LASER MICROMACHINING; MICROFLUIDIC; ON CHIPS; P-I-N PHOTODIODE; PLASMA SEPARATIONS; RADIATION DETECTIONS; SI BASED;

GLASS;

EID: 58049157895     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MNRC.2008.4683389     Document Type: Conference Paper

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