Effect of deposition voltage on the microstructure of electrochemically deposited hydrogenated amorphous carbon films

Carbon

Volumn 42, Issue 15, 2004, Pages 3103-3108

  Yan, X B ^a   Xu, T ^a   Chen, G ^a   Liu, H W ^a   Yang, S R ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

Author keywords

A. Carbon films; B. Electrochemical treatment; C. Raman spectroscopy; D. Microstructure

Indexed keywords

CARBON; DEPOSITION; ELECTROCHEMISTRY; HYDROGENATION; MICROSTRUCTURE; RAMAN SPECTROSCOPY; VOLTAGE MEASUREMENT;

CURVE FITTING TECHNIQUE; DEPOSITION VOLTAGE; NANOINDENTER;

AMORPHOUS MATERIALS;

EID: 5744241713     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2004.07.016     Document Type: Article

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