Microstructural analysis and electrical conductivity of hexagonal WO 3 thin films during annealing

Physica Status Solidi (A) Applications and Materials Science

Volumn 205, Issue 12, 2008, Pages 2880-2885

  Al Mohammad, Ahmad ^a  

^a DEPARTMENT OF MOLECULAR BIOLOGY AND BIOTECHNOLOGY   (Syrian Arab Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; ARRHENIUS EQUATIONS; DO-MAINS; ELECTRICAL CONDUCTIVITIES; GRAIN SIZES; HEXAGONAL WO; LATTICE PARAMETERS; MICROSTRUCTURAL ANALYSES; MORPHOLOGICAL PROPERTIES; SELECTED AREA ELECTRON DIFFRACTIONS; STRUCTURAL TRANSFORMATIONS;

ACTIVATION ENERGY; ANNEALING; ELECTRIC CONDUCTIVITY; MOISTURE; SINGLE CRYSTAL SURFACES; SINGLE CRYSTALS; SURFACE STRUCTURE; THICK FILMS; THIN FILMS;

THERMAL EVAPORATION;

EID: 57349137237     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200723232     Document Type: Article

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