Field-effect transistor fabricated with nickel(II) etioporphyrin-I micrometer-sized crystals

Applied Physics Letters

Volumn 93, Issue 22, 2008, Pages

  Xu, Zong Xiang ^a   Xiang, Hai Feng ^a   Roy, V A L ^a   Chui, Stephen Sin Yin ^a   Che, Chi Ming ^a   Lai, P T ^a  

^a UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHY; CRYSTALS; FABRICATION; FIELD EFFECT TRANSISTORS; HOLE MOBILITY; MICROMETERS; NICKEL ALLOYS; NICKEL COMPOUNDS; THICK FILMS; THICKNESS MEASUREMENT; THIN FILM DEVICES; THIN FILMS; TRANSISTORS;

ACTIVE MATERIALS; HIGH VACUUMS; MICRO WIRES; ORDERS OF MAGNITUDES; SOLVENT MOLECULES; THIN-FILM STRUCTURES;

CRYSTAL STRUCTURE;

EID: 57349113069     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3040319     Document Type: Article

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