Aberration correction for electron beam inspection, metrology, and lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2331-2336

  Munro, Eric ^a   Rouse, John ^a   Liu, Haoning ^a   Wang, Liping ^a  

^a Munro's Electron Beam Software Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON GUNS; GEOMETRICAL OPTICS; INDUSTRIAL APPLICATIONS; MIRRORS; OPTICAL PROPERTIES; PARTICLE BEAMS; SPHERES;

ABERRATION CORRECTIONS; ABERRATION CORRECTORS; CHROMATIC ABERRATIONS; CRITICAL DIMENSION SCANNING ELECTRON MICROSCOPIES; DIFFERENTIAL ALGEBRAIC; ELECTRON BEAM INSPECTIONS; ELECTRON MIRRORS; HEXAPOLE; LARGER FIELDS; MIRROR CORRECTORS; NUMERICAL APERTURES; OPTICAL ABERRATIONS; QUADRUPOLE; RESOLVING POWERS; SEMICONDUCTOR MANUFACTURING INDUSTRIES; SPHERICAL ABERRATIONS;

ELECTRONS;

EID: 57249104984     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2991515     Document Type: Article

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