Aberration correction for charged particle lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4510, Issue , 2001, Pages 218-224

  Munro, Eric ^a   Zhu, Xieqing ^a   Rouse, John ^a   Liu, Haoning ^a  

^a Munro's Electron Beam Software Ltd   (United Kingdom)

Author keywords

Aberration correctors; Charged particle lithography; Electron optics; Hexapole lenses; High throughput

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; ELECTRON BEAMS; ELECTRON LENSES; ELECTRON OPTICS; ION BEAM LITHOGRAPHY; PROJECTION SYSTEMS; THROUGHPUT;

ABERRATION CORRECTORS;

CHARGED PARTICLES;

EID: 0035764960     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.451284     Document Type: Conference Paper

References (10)

1. H.C. Pfeiffer and W. Stickel, "Large field electron optics - limitations and enhancements", Proc. SPIE, 2522, 23-30 (1995).
2. W.K. Waskiewicz, S.D. Berger, L.R. Herriott, M.M. Mkrtchyan, and S.W. Bowler, "Electron-optical design for the SCALPEL proof-of-concept tool", Proc SPIE, 2522, 13-22 (1995).
3. A. Chalupka, G. Stengl, H. Buschbech, G. Lammer, H. Vonach, R. Fischer et al., "Novel electrostatic column for ion beam lithography", J. Vac. Si. Technol., B12, 3513-3517 (1994).
4. H. Rose, Optik, 85, 19 (1990).
5. J. Zach and M. Haider, Nuclear Instruments and Methods in Physics Research, A363, 316 (1995).
6. M. Haider, S. Uhlemann, E. Schwan, H. Rose, B. Kabius and K. Urban, Nature, 392, 768 (1998).
7. th European Congress on Electron Microscopy, Brno, Czech Republic, July 9-14, 2000, Vol. 3, I21 - I24 (2000).
8. X. Zhu, E. Munro, J.A. Rouse and W.K. Waskiewicz, "Comprehensive Analysis of Electron Optical Design of SCALPEL®-HT/Alpha", Proc. SPIE, 3997, 170-183 (2000).
9. E. Munro, X. Zhu, J. Rouse and E. Munro, "PROJECTION, SOFEM, CO-3D, ABERM and IMAGE Software Packages, User Manuals," Munro's Electron Beam Software Ltd, London, UK (2001).
10. O. Scherzer, Z. Physik, 101, 593 (1936).