SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2131-2134

Linewidth uniformity in Lloyd's mirror interference lithography systems

(2) O'Reilly, Thomas B a Smith, Henry I a

a MASSACHUSETTS INSTITUTE OF TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION METHODS; DOSE MODULATIONS; EXPOSURE PARAMETERS; INTERFERENCE LITHOGRAPHIES; LINEWIDTH UNIFORMITIES; LINEWIDTH VARIATIONS; LLOYD'S MIRRORS;

CONTROL THEORY; ELECTRIC LOAD MANAGEMENT; LIGHT MODULATION; MIRRORS; MODULATION; PHOTOLITHOGRAPHY;

LINEWIDTH;

EID: 57249086356 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.3013391 Document Type: Article

Times cited : (26)

References (7)

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