Reversible charge injection in antiferroelectric thin films

Applied Physics Letters

Volumn 93, Issue 21, 2008, Pages

  Jiang, A Q ^a   Tang, T A ^a   Corkovic, S ^b   Zhang, Q ^b  

^a FUDAN UNIVERSITY   (China)

^b CRANFIELD UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROELECTRICITY; CAPACITANCE; CAPACITORS; CHARGE INJECTION; DIELECTRIC DEVICES; ELECTRIC EQUIPMENT; FERROELECTRIC FILMS; FERROELECTRICITY; OHMIC CONTACTS; PLATINUM; THICK FILMS; THIN FILM CIRCUITS; ZIRCONIUM;

ANTIFERROELECTRIC; ANTIFERROELECTRIC THIN FILMS; ELECTRICAL FIELDS; FERROELECTRIC CAPACITORS; FERROELECTRIC PHASE; FILM CAPACITORS; HIGH SPEEDS; NANO-SECONDS; PHASE-TRANSITION; SCHOTTKY EMISSIONS; STORED CHARGES; THEORETICAL MODELING;

PHASE TRANSITIONS;

EID: 57049137680     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3039073     Document Type: Article

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