Metal patterning using maskless vacuum evaporation process based on selective deposition of photochromic diarylethene

Applied Physics Letters

Volumn 93, Issue 21, 2008, Pages

  Takagi, Rie ^a   Masui, Kyoko ^a   Nakamura, Shinichiro ^b   Tsujioka, Tsuyoshi ^a  

^a OSAKA KYOIKU UNIVERSITY   (Japan)

^b MITSUBISHI CHEMICAL CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EVAPORATION; MAGNESIUM PRINTING PLATES; METALS; MOISTURE; OPTICAL PROPERTIES; PHOTOCHROMISM; VACUUM DEPOSITION; VAPORS;

EVAPORATION PROCESSES; MASK LESS; MG DEPOSITIONS; ORGANIC ELECTRONIC DEVICES; PATTERNING METHODS; PHOTOCHROMIC DIARYLETHENE; SELECTIVE DEPOSITIONS; SELECTIVE METAL DEPOSITIONS; SHADOW MASKS; UV IRRADIATIONS; VAPOR ATOMS;

VACUUM EVAPORATION;

EID: 57049114912     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3028650     Document Type: Article

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