Preparation and conductive properties of neodymium-doped lanthanum nickelate thin films by chemical solution deposition method

Thin Solid Films

Volumn 517, Issue 5, 2009, Pages 1563-1566

  Wu, Guangheng ^a   Ruan, Kaibin ^a   Liang, Tong ^a   Chen, Xinman ^a   Bao, Dinghua ^a  

^a SUN YAT SEN UNIVERSITY   (China)

Author keywords

Chemical solution deposition; Dielectric properties; Electrode; Ferroelectric properties; La1 xNdxNiO3; Lanthanum neodymium nickelate; Nickel oxide; Resistivity; Thin film; X ray diffraction

Indexed keywords

CHEMICAL PROPERTIES; CHEMICALS; CONDUCTIVE FILMS; DIELECTRIC PROPERTIES; DIFFRACTION; ELECTRIC PROPERTIES; FIELD EMISSION; LANTHANUM; LANTHANUM ALLOYS; NEODYMIUM; NICKEL OXIDE; OXIDE MINERALS; PEROVSKITE; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SOLIDS; THICK FILMS; THIN FILMS; VAPOR DEPOSITION; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ANNEALING TEMPERATURES; CHEMICAL SOLUTION DEPOSITION; CHEMICAL SOLUTION DEPOSITION METHODS; CONDUCTIVE PROPERTIES; DEGREE OF ORIENTATIONS; ELECTRICAL PROPERTIES; FERROELECTRIC PROPERTIES; FIELD EMISSION SCANNING ELECTRON MICROSCOPIES; LA1 - XNDXNIO3; LANTHANUM NICKELATE; NEODYMIUM CONTENTS; NEODYMIUM DOPING; ORIENTATION DEGREES; PEROVSKITE STRUCTURES; PREFERENTIAL ORIENTATIONS; RESISTIVITY; SI SUBSTRATES; SMOOTH SURFACES; UNIFORM THICKNESSES;

FILM PREPARATION;

EID: 56949108656     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.09.045     Document Type: Article

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