Preparation of LaNiO3 thin films by mist plasma evaporation

Thin Solid Films

Volumn 462-463, Issue SPEC. ISS., 2004, Pages 123-126

  Huang, Hui ^a   Yao, Xi ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

LaNiO3; Plasma processing and deposition; Resistivity; Surface morphology

Indexed keywords

LANIO3; MIST PLASMA EVAPORATION; PLASMA PROCESSING AND DEPOSITION; PRECURSORS;

ANNEALING; ATMOSPHERIC PRESSURE; ATOMIZATION; CONCENTRATION (PROCESS); GRAIN SIZE AND SHAPE; INDUCTIVELY COUPLED PLASMA; LANTHANUM COMPOUNDS; POLYCRYSTALLINE MATERIALS; SILICON WAFERS; SOLUTIONS; SUBSTRATES; THIN FILMS;

EVAPORATION;

EID: 4344625967     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.05.078     Document Type: Article

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