Preparation and characterization of α-Fe2O3 nanorod-thin film by metal-organic chemical vapor deposition

Thin Solid Films

Volumn 517, Issue 5, 2009, Pages 1853-1856

  Cha, Hyun Gil ^a   Kim, Chang Woo ^a   Kim, Young Hwan ^b   Jung, Mi Hyang ^b   Ji, Eun Sun ^a   Das, Bijoy K ^b   Kim, Ju Chang ^b   Kang, Young Soo ^a  

^a Sogang University   (South Korea)

^b Pukyong National University   (South Korea)

Author keywords

Fe2O3 nanorods; Metal organic chemical vapor deposition; Photo degradation; Rhodamine B; Rhombohedral structure; Vertical reactor

Indexed keywords

BUILDING MATERIALS; DEGRADATION; FILM PREPARATION; INDUSTRIAL CHEMICALS; IRON OXIDES; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MAGNETIC DOMAINS; MAGNETIC FORCE MICROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; ORGANIC COMPOUNDS; OXIDE FILMS; PHOTODEGRADATION; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THICK FILMS; VAPORS;

ALPHA IRONS; BUILDING BLOCKS; CATALYTIC PROPERTIES; EMISSION TRANSMISSIONS; FREE SILICONS; MAGNETIC FORCE MICROSCOPY IMAGES; NANODEVICE APPLICATIONS; NANOROD FILMS; ORGANIC CHEMICAL VAPOR DEPOSITIONS; POWDER DIFFRACTIONS; PREFERRED GROWTHS; RHODAMINE B; RHOMBOHEDRAL STRUCTURE; RHOMBOHEDRAL STRUCTURES; SPIN DOMAINS; UV IRRADIATIONS; VERTICAL REACTOR; VERTICAL TYPES;

NANORODS;

EID: 56949097024     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.10.023     Document Type: Article

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