Oxidation of hydrogen terminated Ge(1 0 0) surface in the presence of iodine in methanol

Applied Surface Science

Volumn 255, Issue 5 PART 2, 2008, Pages 3318-3321

  Lee, Younghwan ^a   Park, Kibyung ^a   Lim, Sangwoo ^a  

^a Yonsei University   (South Korea)

Author keywords

Alcohols; Germanium; Infrared absorption spectroscopy; Iodine; Oxidation; Surface structure, morphology, roughness, and topography

Indexed keywords

ABSORPTION SPECTROSCOPY; ALCOHOLS; GERMANIUM; GERMANIUM OXIDES; HYDROGEN; INFRARED ABSORPTION; IODINE; LIGHT ABSORPTION; METHANOL; OXIDATION;

LIQUID METHANOL; OXIDATION MECHANISMS; OXIDATION OF HYDROGEN; OXIDE LAYER; OXIDE STRUCTURES; SERIES REACTION; SURFACE STRUCTURE , MORPHOLOGY , ROUGHNESS , AND TOPOGRAPHY; THINNER OXIDES;

SURFACE REACTIONS;

EID: 56949084455     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.09.052     Document Type: Article

References (19)

1. Sze S.M. Physics of Semiconductor Devices. second ed. (1981), John Wiley & Sons, New York
2. Lee M.L., Leitz C.W., Cheng Z., Pitera A.J., Langdo T., Currie M.T., Taraschi G., Fitzgerald E.A., and Antoniadis D.A. Appl. Phys. Lett. 79 (2001) 3344
3. Soon J.M., Lim C.W., Loh K.P., Ma N.L., and Wu P. Phys. Rev. B 72 (2005) 115343
4. Prabhakaran K., and Ogino T. Surf. Sci. 325 (1995) 263
5. Valyocsik E.W. J. Electrochem. Soc. 114 (1967) 176
6. Zhang X.-J., Xue G., Agarwal A., Tsu R., Hasan M.-A., Greene J.E., and Rockett A. J. Vac. Sci. Technol. A 11 (1993) 2553
7. Bodlaki D., Yamamoto H., Waldeck D.H., and Borguet E. Surf. Sci. 543 (2003) 63
8. Lim C.W., Soon J.M., Ma N.L., Chen W., and Loh K.P. Surf. Sci. 575 (2005) 51
9. Bae S.-S., Kim D.H., Kim A., Jung S.J., Hong S., and Kim S. J. Phys. Chem. C 111 (2007) 15013
10. Rivillon S., Chabal Y.J., Amy F., and Kahn A. Appl. Phys. Lett. 89 (2005) 253101
11. Stuart B.H. Infrared Spectroscopy: Fundamentals and Applications (2004), Wiley, UK
12. Haber J.A., Lauermann I., Michalak D., Vaid T.P., and Lewis N.S. J. Phys. Chem. B 104 (2000) 9947
13. Mo R.T., Burr T.A., Merklin G.T., Machuca F., Pianetta P.A., Kimerling L.C., Chiarello R.P., and Chidsey C.E.D. Proceedings of the 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, vol. 99-36 (1999) 545
14. Royea W.J., Michalak D.J., and Lewis N.S. Appl. Phys. Lett. 77 (2000) 2566
15. Cruickshank F.R., and Benson S.W. J. Phys. Chem. 73 (1969) 733
16. Fox M., McIntyre R., and Hayon E. Faraday Discuss. Chem. Soc. 64 (1977) 167
17. Fox M.F., and Hayon E. J. Chem. Soc., Faraday Trans. 173 (1977) 1003
18. Nielsen S.O., Michael B.D., and Hart E.J. J. Phys. Chem. 80 (1976) 2482
19. Fahr A., Nayak A.K., and Kurylo M.J. Chem. Phys. 197 (1995) 195