Application of an interferometric phase contrast method to fabricate arbitrary diffractive optical elements

Applied Optics

Volumn 47, Issue 14, 2008, Pages 2550-2556

  Teschke, Marcel ^a   Heyer, Robert ^a   Fritzsche, Marco ^a   Stoebenau, Sebastian ^a   Sinzinger, Stefan ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (OPTICAL); DIFFRACTIVE OPTICAL ELEMENTS; HOLOGRAMS; PHOTORESISTS;

COMPLEX OBJECTS; FRESNEL LENS; INTENSITY PATTERNS; INTERFEROMETRIC PHASE; ON-AXIS; PHASE OBJECT; PHOTORESIST LAYERS; PRECISE CONTROL;

INTERFEROMETRY;

EID: 56849127893     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.002550     Document Type: Article

References (19)

1. S. Sinzinger and J. Jahns, Microoptics (Wiley-VCH, 2003).
2. R. Brunner, R. Steiner, H. J. Dobschal, and K. Rudolf, "Hybrid diffractive-refractive optics: opportunities and technologies to realize complex optical imaging systems," Glass Sci. Technol. 76, 91-96 (2003).
3. R. Brunner, R. Steiner, H. J. Dobschal, D.Martin, M. Burkhardt, and M. Helgert, "Universal grating design for pulse stretching and compression in the 800-1100nm range," Proc. SPIE 5183, 47-55 (2003).
4. W. W. Ng, C. S. Hong, and A. Yariv, "Holographic interference lithography for integrated optics," IEEE Trans. Electron Devices 25, 1193-1200 (1978)
5. J. Turunen and F. Wyrowski, Diffractive Optics for Industrial and Commercial Applications (Akademie Verlag, 1997).
6. J. A. Britten, M. D. Perry, B. W. Shore, and R. D. Boyd, "Universal grating design for pulse stretching and compression in the 800-1100nm range," Opt. Lett. 21, 540-542 (1996)
7. A. Fernandez, H. T. Nguyen, J. A. Britten, R. D. Boyd, M. D. Perry, D. R. Kania, and A. M. Hawryluk, "Use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays," J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct. Process. Meas. Phenom. 15, 729-735 (1997).
8. M. Teschke and S. Sinzinger, "Modified phase contrast for recording of holographic optical elements," Opt. Lett. 32, 2067-2069 (2007).
9. J. W. Goodman, Introduction to Fourier Optics (McGraw-Hill, 1996).
10. F. Zernike, "How I discovered phase contrast," Science 121, 345-349 (1955).
11. D. Malacara, Optical Shop Testing (Wiley-VCH, 1992).
12. W. Lauterborn, T. Kurz, and M. Wiesenfeldt, Kohärente Optik (Springer-Verlag, 1993).
13. J. Glückstad and P. C. Mogensen, "Optimal phase contrast imaging in common path interferometry," Appl. Opt. 40, 268-282 (2001).
14. S. Osten, S. Krüger, and A. Steinhoff, "Spatial light modulators based on reflective microdisplays," Technisches Messen 73, 149-156 (2006).
15. Allresist GmbH, http://www.allresist.de.
16. M. Hofmann, S. Stoebenau, and S. Leopold, Department of Optical Engineering, Technische Universität Ilmenau, P.O. Box 10 05 65, 98684 Ilmenau, Germany, are preparing a manuscript to be called "Characterization of a photoresist for analog lithography in the visible range."
17. S. Krüger, S. Osten, and G. Wernicke, "Reflective spatial light modulators improve digital holography," http://www.holoeye.com/ publications1.html.
18. B. R. Brown and A. W. Lohmann, "Complex spatial filtering with binary masks," Appl. Opt. 5, 967-969 (1966).
19. A. W. Lohmann and S. Sinzinger, "Graphic codes for computer holography," Appl. Opt. 34, 3172-3178 (1995).