Potential of far-ultraviolet absorption spectroscopy as a highly sensitive analysis method for aqueous solutions. Part II: Monitoring the quality of semiconductor wafer cleaning solutions using attenuated total reflection

Applied Spectroscopy

Volumn 62, Issue 9, 2008, Pages 1022-1027

  Higashi, Noboru ^a   Ikehata, Akifumi ^b   Kariyama, Naomi ^a   Ozaki, Yukihiro ^b  

^a KURABO INDUSTRIES LTD   (Japan)

^b KWANSEI GAKUIN UNIVERSITY   (Japan)

Author keywords

Aqueous solutions; ATR; Attenuated total reflection; Far ultraviolet; Penetration depth; Qualitative analysis; Quantitative analysis; Semiconductor wafer cleaning; Water

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL ANALYSIS; CLEANING; ELECTROMAGNETIC WAVE REFLECTION; HYDROGEN BONDS; LINEAR REGRESSION; PENETRATION DEPTH (SUPERCONDUCTIVITY); QUARTZ; REFRACTIVE INDEX; SILICON WAFERS; SOLUTIONS; WAFER BONDING; WATER; WATER ABSORPTION;

ATTENUATED TOTAL REFLECTIONS; FAR ULTRAVIOLET; INTERNAL REFLECTION ELEMENTS; MULTIPLE LINEAR REGRESSIONS; QUALITATIVE ANALYSIS; SEMI-CONDUCTOR FABRICATION; SEMICONDUCTOR WAFER CLEANING; TRANSMITTANCE MEASUREMENTS;

SOLUTION MINING;

EID: 56849115158     PISSN: 00037028     EISSN: None     Source Type: Journal    
DOI: 10.1366/000370208785793236     Document Type: Article

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