SCOPUS 정보 검색 플랫폼

Applied Spectroscopy

Volumn 59, Issue 7, 2005, Pages 952-955

Near-infrared spectroscopy for monitoring wafer etchant solution using a teflon tube

(4) Lee, Youngbok a Nah, Sanghee a Namkung, Hankyu a Chung, Hoeil a

a Hanyang University (South Korea)

Author keywords

Near infrared spectroscopy; Semi conductor cleaning; Teflon; Wafer etchant

Indexed keywords

CONCENTRATION (PROCESS); FLUOROCARBONS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED SPECTROSCOPY; POLYTETRAFLUOROETHYLENES; SOLUTIONS; SPECTROMETERS; TUBES (COMPONENTS);

NEAR-INFRARED (NIR) SPECTROSCOPY; SEMI-CONDUCTOR CLEANING; TEFLON TUBE; WAFER ETCHANT;

SEMICONDUCTOR MATERIALS;

HYDROFLUORIC ACID; POLITEF; SOLVENT; WATER;

ARTICLE; CHEMISTRY; DRUG MIXTURE; EVALUATION; INFRARED SPECTROSCOPY; INSTRUMENTATION; LABORATORY DIAGNOSIS; METHODOLOGY; SEMICONDUCTOR; SOLUTION AND SOLUBILITY;

COMPLEX MIXTURES; HYDROFLUORIC ACID; POLYTETRAFLUOROETHYLENE; SEMICONDUCTORS; SOLUTIONS; SOLVENTS; SPECIMEN HANDLING; SPECTROSCOPY, FOURIER TRANSFORM INFRARED; WATER;

EID: 22744443875 PISSN: 00037028 EISSN: None Source Type: Journal
DOI: 10.1366/0003702054411724 Document Type: Article

Times cited : (12)

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