Preparation and resistivity study of siver nanocomposite films using spin-assisted layer-by-layer assembly

Surface and Interface Analysis

Volumn 40, Issue 12, 2008, Pages 1523-1528

  Feng, Zhizhong ^a,b   Yan, Fengyuan ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Nanocomposite film; Resistivity; Silver nanoparticles; Spin assisted layer by layer self assembly

Indexed keywords

ABS RESINS; CHEMICAL VAPOR DEPOSITION; ELECTRON ENERGY LEVELS; FILM PREPARATION; NANOCOMPOSITES; NANOPARTICLES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; POLYMER FILMS; POLYMERS; SELF ASSEMBLY; SILICON; SPIN DYNAMICS;

DEPOSITION TIMES; HIGH RESISTIVITIES; LAYER BY LAYERS; LAYER-BY-LAYER ASSEMBLIES; NANOCOMPOSITE FILM; NANOCOMPOSITE FILMS; POLYMER BILAYERS; POLYMER MULTILAYERS; RESISTIVITY; SILICON SUBSTRATES; SILVER METALS; SILVER NANOPARTICLES; SPIN-ASSISTED LAYER-BY-LAYER SELF- ASSEMBLY;

SILVER;

EID: 56749175976     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2927     Document Type: Article

References (24)

1. Y. Lvov, A. Antipov, A. Mamedov, H. Mö, G. Sukhorukov, Nano Lett. 2001, 1, 125.
2. N. Malikova, I. Pastoriza-Santos, M. Schierhorn, N. Kotov, M. Liz-Marzan, Langmuir 2002, 18, 3694.
3. S. Y. Yang, M. F. Rubner, J. Am. Chem. Soc. 2002, 124, 2100.
4. C. Y. Jiang, D. S. Kommireddy, V.V. Tsukruk, Adv. Funct. Mater. 2006, 16, 27.
5. V. V. Tsukruk, Adv. Mater, 1998, 10, 253.
6. Z. M. Qi, I. Honma, M. Ichihara, H. S. Zhou, Adv. Funct. Mater. 2006, 16, 377.
7. V. A. Sinani, D. S. Koktysh, B. G. Yun, R. L. Matts, T. C. Pappas, M. Motamedi, S. N. Thomas, N. A. Kotov, Nano Lett. 2003, 3, 1177.
8. J. H. Fendler, Chem. Mater. 2001, 13, 3196.
9. N. Krasteva, I Besnard, B. Guse, R. E. Bauer, K. Mullen, A. Yasuda, T. Vossmeyer, Nano Lett. 2002, 2, 551.
10. Z. Wang, T. Sasaki, M. Muramatsu, Y. Ebina, T. Tanaka, L. Wand, M. Watanabe, Chem. Mater. 2003, 15, 807.
11. S. R. Sershen, S. L. Westcott, N. J. Halas, J. L. West, Appl. Phys. Lett. 2002, 80, 4609.
12. I. M. Yakutik, G. P. Shevchenko, Surf. Sci. 2004, 566-568, 414.
13. J. H. Zhang, X. L. Li, K. Liu, Z. C. Cui, G. Zhang, B. Zhao, B. Yang, J. Colloid Interface Sci. 2002, 255, 115.
14. S. H. Park, J. H. Im, J. W. Im, B. H. Chun, J. H. Kim, Microchem. J. 1999, 63, 71.
15. R. Dannenberg, E. A. Stach, J. R. Groza, B. J. Dresser, Thin Solid Films 2000, 370, 54.
16. D. G. Li, S. H. Chen, S. Y. Zhao, X. M. Hou, H. Y. Ma, X. G. Yang, Thin Solid Films 2004, 460, 78.
17. J. V. Zoval, R. M. Stiger, P. R. Biernacki, R.M. Penner, J. Phys. Chem. 1996, 100, 837.
18. M. Sastry, K. S. Mayya, V. Patil, D. V. Paranjape, S. G. Hegde, J. Phys. Chem. B 1997, 101, 4954.
19. X. H. Liu, J. Q. Wang, J. Y. Zhang, B. Liu, J. F. Zhou, S. R. Yang, Thin Solid Films 2007, 515, 7870.
20. C. Y. Jiang, S. Markutsya, V. V. Tsukruk, Langmuir 2004, 20, 882.
21. Z. Z. Feng, F. Y. Yan, Surf. Coat. Technol. 2008, 202, 3290.
22. S. L. Ren, S. R. Yang, J. Q. Wang, W. M. Liu, Y. P. Zhao, Chem. Mater. 2004, 16, 428.
23. X. Z. Lin, X. W. Teng, H. Yang, Langmuir 2003, 19, 10081.
24. F. M. John, F. S. William, E. S. Peter, D. B. Kennrth, Handbook of X-ray Photoelectroscopy, Physical Electronics Press: Minnesota, 1995.