Island dynamics algorithm for kinetically limited electrochemical nucleation of copper with additives onto a foreign substrate

Journal of the Electrochemical Society

Volumn 156, Issue 1, 2009, Pages

  Stephens, Ryan M ^a   Alkire, Richard C ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; ADATOMS; ADDITIVES; COMPUTATIONAL LINGUISTICS; CONCENTRATION (PROCESS); COPPER; COPPER PLATING; DYNAMICS; ETHYLENE GLYCOL; GLYCOLS; NUCLEATION; ORDINARY DIFFERENTIAL EQUATIONS; ORE DEPOSIT GEOLOGY; POLYETHYLENE GLYCOLS; POLYETHYLENE OXIDES; RATE CONSTANTS;

COMPUTATIONAL SPEEDS; CONTINUUM EQUATIONS; COPPER DEPOSITIONS; ELECTROCHEMICAL NUCLEATIONS; ELECTRODEPOSITION PROCESSES; FOREIGN SUBSTRATES; ISLAND DYNAMICS; KINETIC MONTE CARLO; KMC SIMULATIONS; METAL DEPOSITS; MOLECULAR ENGINEERINGS; MOVING INTERFACES; MULTILAYER STRUCTURES; NUCLEATION AND GROWTHS; NUCLEATION DENSITIES; NUMERICAL RESULTS; RATE EQUATIONS; REACTION INTERMEDIATES; SIMULATION RESULTS; SPATIAL INFORMATIONS; SULFATE ELECTROLYTES; TIME SCALES;

SURFACE DIFFUSION;

EID: 56749166074     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3009590     Document Type: Article

References (39)

1. E. Budevski, G. Staikov, and W. J. Lorenz, Electrochemical Phase Formation and Growth, VCH, Weinheim, Germany (1996).
2. A. Milchev, Electrocrystallization: Fundamentals of Nucleation and Growth, Kluwer Academic Publishers, Boston, MA (2002).
3. B. Scharifker and G. Hills, Electrochim. Acta, 28, 879 (1983).
4. M. E. Hyde and R. G. Compton, J. Electroanal. Chem., 549, 1 (2003).
5. G. Zinsmeister, Vacuum, 16, 529 (1966).
6. J. A. Venables, Philos. Mag., 27, 697 (1973).
7. M. C. Bartelt and J. W. Evans, Phys. Rev. B, 46, 12675 (1992).
8. C. Ratsch, A. Zangwill, P. Smilauer, and D. D. Vvedensky, Phys. Rev. Lett., 72, 3194 (1994).
9. J. Villain, A. Pimpinelli, L. Tang, and D. Wolf, J. Phys. I, 2, 2107 (1992).
10. G. S. Bales and D. C. Chrzan, Phys. Rev. B, 50, 6057 (1994).
11. D. Gillespie, J. Phys. Chem., 81, 2340 (1977).
12. J. D. Weeks and G. H. Gilmer, Adv. Chem. Phys., 40, 157 (1979).
13. S. Clarke and D. D. Vvedensky, Phys. Rev. Lett., 58, 2235 (1987).
14. T. O. Drews, R. D. Braatz, and R. C. Alkire, Int. J. Multiscale Comp. Eng., 2, 313 (2004).
15. T. O. Drews, S. Krishnan, J. C. Alameda, D. Gannon, R. D. Braatz, and R. C. Alkire, IBM J. Res. Dev., 49, 49 (2005).
16. X. Li, T. O. Drews, E. Rusli, F. Xue, Y. He, R. Braatz, and R. Alkire, J. Electrochem. Soc., 154, D230 (2007).
17. T. O. Drews, A. Radisic, J. Erlebacher, R. D. Braatz, P. C. Searson, and R. C. Alkire, J. Electrochem. Soc., 153, C434 (2006).
18. R. M. Stephens and R. C. Alkire, J. Electrochem. Soc., 154, D418 (2007).
19. T. O. Drews, R. D. Braatz, and R. C. Alkire, Z. Phys. Chem., 221, 1287 (2007).
20. C. Ratsch and J. A. Venables, J. Vac. Sci. Technol. A, 21, S96 (2003).
21. J. W. Evans, P. A. Thiel, and M. C. Bartelt, Surf. Sci. Rep., 61, 1 (2006).
22. F. Xue, Ph.D. Thesis, University of Illinois, Urbana, IL (2006).
23. R. Braatz, E. Seebauer, and R. Alkire, in Advances in Electrochemical Science and Engineering, R. Alkire, D. Kolb, J. Lipkowski, and, P. Ross, Editors, Vol. 10, VCH-Wiley Publishers, Weinheim (2008).
24. J. P. DeVita, L. M. Sander, and P. Smereka, Phys. Rev. B, 72, 205421 (2005).
25. L. Mandreoli, J. Neugebauer, R. Kunert, and E. Schöll, Phys. Rev. B, 68, 155429 (2003).
26. J. Russo, L. M. Sander, and P. Smereka, Phys. Rev. B, 69, 121406 (2004).
27. Z. Zheng, R. Stephens, R. Braatz, R. Alkire, and L. Petzold, J. Comp. Physiol., 227, 5184 (2008).
28. R. E. Caflisch, M. Gyure, B. Merriman, S. Osher, C. Ratsch, D. Vvedensky, and J. Zinck, Appl. Math. Lett., 12, 13 (1999).
29. M. Petersen, C. Ratsch, R. E. Caflisch, and A. Zangwill, Phys. Rev. E, 64, 061602 (2001).
30. C. Ratsch, M. F. Gyure, R. E. Caflisch, F. Gibou, M. Petersen, M. Kang, J. Garcia, and D. D. Vvedensky, Phys. Rev. B, 65, 195403 (2002).
31. R. M. Stephens, Ph.D. Thesis, University of Illinois, Urbana, IL (2008).
32. C. Ratsch, M. F. Gyure, S. Chen, M. Kang, and D. D. Vvedensky, Phys. Rev. B, 61, R10598 (2000).
33. M. H. Holzle, V. Zwing, and D. M. Kolb, Electrochim. Acta, 40, 1237 (1995).
34. S. Osher and R. Fedkiw, Level Set Methods and Dynamic Implicit Surfaces, Springer-Verlag, New York (2003).
35. P. M. Vereecken, R. A. Binstead, H. Deligianni, and P. C. Andricacos, IBM J. Res. Dev., 49, 3 (2005).
36. E. Rusli, F. Xue, T. O. Drews, X. Li, H. Deligianni, P. Vereecken, P. Andricacos, R. D. Braatz, and R. C. Alkire, J. Electrochem. Soc., 154, D584 (2007).
37. M. P. Karulkar, Ph.D. Thesis, University of Illinois, Urbana, IL (2007).
38. P. Shewmon, Diffusion in Solids, Minerals, Metals, & Materials Society, Warrendale, PA (1989).
39. S. Chen, B. Merriman, M. Kang, R. E. Caflisch, C. Ratsch, L. Cheng, M. Gyure, R. P. Fedkiw, C. Anderson, and S. Osher, J. Comp. Physiol., 167, 475 (2001).