Application of low resistivity Ga-doped ZnO films to transparent electromagnetic interference shielding material

Thin Solid Films

Volumn 517, Issue 3, 2008, Pages 1027-1031

  Yamada, Takahiro ^a   Morizane, Toshiyuki ^a   Arimitsu, Tetsuhiro ^a   Miyake, Aki ^a   Makino, Hisao ^a   Yamamoto, Naoki ^a   Yamamoto, Tetsuya ^a  

^a KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

EMI; Glass; GZO; Ion planting; TCO; ZuO

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC RESISTANCE; ELECTROMAGNETIC COMPATIBILITY; ELECTROMAGNETIC PULSE; ELECTROMAGNETIC WAVE INTERFERENCE; ELECTROMAGNETIC WAVES; GALLIUM ALLOYS; GALVANOMAGNETIC EFFECTS; GLASS; HALL EFFECT; MAGNETIC FIELD EFFECTS; MAGNETIC SHIELDING; METALLIC FILMS; RADIATION PROTECTION; RADIATION SHIELDING; SEMICONDUCTING ZINC COMPOUNDS; SHEET RESISTANCE; SHIELDING; SIGNAL INTERFERENCE; SUBSTRATES; ZINC ALLOYS; ZINC OXIDE;

ELECTROMAGNETIC INTERFERENCE SHIELDING; ELECTROMAGNETIC INTERFERENCES; EMI; EMI SHIELDING; GLASS SUBSTRATES; GZO; HALL EFFECT MEASUREMENTS; LOW RESISTIVITIES; PLATING SYSTEMS; SHIELDING EFFECTIVENESSES; TCO; ZNO FILMS; ZUO;

ELECTROMAGNETIC SHIELDING;

EID: 56649117547     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.06.047     Document Type: Article

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