Electrochemical and photoelectrochemical study of the self-assembled monolayer phytic acid on cupronickel B30

Corrosion Science

Volumn 50, Issue 12, 2008, Pages 3527-3533

  Hao, Chen ^a   Yin, Ren He ^a   Wan, Zong Yue ^a   Xu, Qun Jie ^b   Zhou, Guo Ding ^b  

^a SHANGHAI UNIVERSITY   (China)

^b SHANGHAI UNIVERSITY OF ELECTRIC POWER   (China)

Author keywords

A. Cupronickel; A. Phytic acid; A. Self assembled monolayer; B. Photoelectrochemistry; C. Corrosion

Indexed keywords

ACOUSTIC MICROSCOPES; ADSORPTION; AMPLITUDE MODULATION; CHEMISORPTION; COPPER; CORROSION; CORROSION PROTECTION; CORROSION RESISTANCE; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTRON ENERGY LEVELS; MISSILE BASES; SELF ASSEMBLED MONOLAYERS;

A. CUPRONICKEL; A. PHYTIC ACID; A. SELF-ASSEMBLED MONOLAYER; B. PHOTOELECTROCHEMISTRY; C. CORROSION;

ACIDS;

EID: 56649099037     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.corsci.2008.09.016     Document Type: Article

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