Carbon nanotube-incorporated direct-patternable SnO2 thin films formed by photochemical metal-organic deposition

Thin Solid Films

Volumn 517, Issue 3, 2008, Pages 1072-1076

  Kim, Hyuncheol ^a   Park, Hyeong Ho ^a   Chang, Ho Jung ^b   Jeon, Hyeongtag ^c   Park, Hyung Ho ^a  

^a Yonsei University   (South Korea)

^b Dankook University   (South Korea)

^c Hanyang University   (South Korea)

Author keywords

Multi wall carbon nanotube; Photochemical metal organic deposition; SnO2 film; Transparent conducting oxide

Indexed keywords

CARBON; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; MULTIWALLED CARBON NANOTUBES (MWCN); NANOCOMPOSITES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NANOTUBES; ORGANIC CARBON; PLASMA ETCHING; THICK FILMS; THIN FILMS;

BONDING NATURES; CHARGE MOBILITIES; CRYSTALLINITY; ELECTRICAL PROPERTIES; HYBRID FILMS; LOW COSTS; MULTI-WALL CARBON NANOTUBE; ORGANIC DEPOSITIONS; PHOTOCHEMICAL METAL-ORGANIC DEPOSITION; PHOTOSENSITIVE PRECURSORS; SNO2 FILM; TRANSPARENT CONDUCTING OXIDE;

CARBON NANOTUBES;

EID: 56649094474     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.06.031     Document Type: Article

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