Epitaxial ternary nitride thin films prepared by a chemical solution method

Journal of the American Chemical Society

Volumn 130, Issue 46, 2008, Pages 15224-15225

  Luo, Hongmei ^a   Wang, Haiyan ^b   Bi, Zhenxing ^b   Feldmann, David M ^a   Wang, Yongqiang ^a   Burrell, Anthony K ^a   McCleskey, T Mark ^a   Bauer, Eve ^a   Hawley, Marilyn E ^a   Jia, Quanxi ^a  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b Texas AandM University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; POLYMER;

ARTICLE; ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; FILM; NITRIDE FILM; NITRIFICATION; ROOM TEMPERATURE; SCANNING ELECTRON MICROSCOPY; SOLUTION AND SOLUBILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

EID: 56449118092     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja803544c     Document Type: Article

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