Fabrication of high-quality submicron Nb/Al-AlOx/Nb tunnel junctions

Chinese Physics B

Volumn 17, Issue 8, 2008, Pages 3083-3086

  Yu, Hai Feng ^a   Cao, Wen Hui ^a   Zhu, Xiao Bo ^a   Yang, Hai Fang ^a   Yu, Hong Wei ^a   Ren, Yu Feng ^a   Gu, Chang Zhi ^a   Chen, Geng Hua ^a   Zhao, Shi Ping ^a  

^a INSTITUTE OF PHYSICS   (China)

Author keywords

Fabrication; Macroscopic quantum phenomena; Nb junctions; Superconducting qubit

Indexed keywords

COMMUNICATION CHANNELS (INFORMATION THEORY); CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); CRITICAL CURRENTS; ELECTRIC CONDUCTIVITY; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FABRICATION; JOSEPHSON JUNCTION DEVICES; NIOBIUM; OXYGEN; QUANTUM INTERFERENCE PHENOMENA; SUPERCONDUCTING DEVICES; SUPERCONDUCTIVITY; TUNNELS;

CRITICAL CURRENT DENSITIES; FIELD DEPENDENCES; JOSEPHSON DEVICES; JOSEPHSON JUNCTIONS; MACROSCOPIC QUANTUM; MACROSCOPIC QUANTUM PHENOMENA; NB ETCHINGS; NB JUNCTIONS; OXIDATION TIMES; OXYGEN PRESSURES; PROCESS USING; SUB MICRONS; SUPERCONDUCTING QUBIT; TEMPERATURE DEPENDENCES;

TUNNEL JUNCTIONS;

EID: 56349150056     PISSN: 16741056     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-1056/17/8/052     Document Type: Article

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