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IEEE Transactions on Applied Superconductivity

Volumn 11, Issue 1 I, 2001, Pages 365-368

Micron and submicron Nb/Al-AlOx/Nb tunnel junctions with high critical current densities

(4) Meng, Xiaofan a,b Zheng, Lizhen a,b Wong, Andre a,b,c Van Duzcr, Theodore a,b

a UNIVERSITY OF CALIFORNIA (United States)

b UNIVERSITY OF CALIFORNIA (United States)

c Fujitsn (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); DIGITAL CIRCUITS; ELECTRIC CURRENT MEASUREMENT; ELECTRON CYCLOTRON RESONANCE; MICROWAVE DEVICES; NIOBIUM; PHOTORESISTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SILICON WAFERS; SPUTTERING;

HIGH CRITICAL CURRENT DENSITY; SUBMILLIMETER MICROWAVE DEVICE; SUPERCONDUCTING DIGITAL CIRCUIT;

TUNNEL JUNCTIONS;

EID: 0035268584 PISSN: 10518223 EISSN: None Source Type: Journal
DOI: 10.1109/77.919358 Document Type: Conference Paper

Times cited : (14)

References (9)

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