Ge/SiGe multiple quantum wells for optical applications

2008 5th International Conference on Group IV Photonics, GFP

Volumn , Issue , 2008, Pages 194-196

  Chrastina, D ^a   Neels, A ^b   Bonfanti, M ^c   Virgilio, M ^d   Isella, G ^a   Griffi, E ^c   Guzzi, M ^c   Grosso, G ^d   Sigg, H ^e   Von Kanel H ^a  

^a POLITECNICO DI MILANO   (Italy)

^b UNIVERSITY OF NEUCHÂTEL   (Switzerland)

^c UNIVERSITY OF MILANO BICOCCA   (Italy)

^d UNIVERSITY OF PISA   (Italy)

^e PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

GERMANIUM; OPTICAL PROPERTIES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR QUANTUM WIRES; WELLS;

MULTIPLE QUANTUM WELLS; OPTICAL APPLICATIONS; OPTICAL TRANSMISSIONS; X-RAY DIFFRACTIONS;

SEMICONDUCTOR QUANTUM WELLS;

EID: 56249139373     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/GROUP4.2008.4638142     Document Type: Conference Paper

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