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Volumn 310, Issue 23, 2008, Pages 4751-4753
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Ripening of InAs quantum dots on GaAs (0 0 1) investigated with in situ scanning tunneling microscopy in metal-organic vapor phase epitaxy
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Author keywords
A1. Low dimensional structures; A1. Surface processes; A3. Metalorganic vapor phase epitaxy; B2. Semiconducting III V materials
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Indexed keywords
ANNEALING;
ARSENIC;
CRYSTAL GROWTH;
GALLIUM ALLOYS;
INDIUM ARSENIDE;
MICROSCOPIC EXAMINATION;
OPTICAL WAVEGUIDES;
OSTWALD RIPENING;
QUANTUM ELECTRONICS;
SCANNING;
SCANNING TUNNELING MICROSCOPY;
SEMICONDUCTING GALLIUM;
SEMICONDUCTING INDIUM;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTOR GROWTH;
SEMICONDUCTOR QUANTUM DOTS;
SILICON;
VAPORS;
A1. LOW DIMENSIONAL STRUCTURES;
A1. SURFACE PROCESSES;
A3. METALORGANIC VAPOR PHASE EPITAXY;
B2. SEMICONDUCTING III-V MATERIALS;
IN SITU STM;
INAS QUANTUM DOTS;
OVER PRESSURES;
QD DENSITIES;
RING OPERATORS;
METALLORGANIC VAPOR PHASE EPITAXY;
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EID: 56249096858
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2008.07.047 Document Type: Article |
Times cited : (11)
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References (13)
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