keV Ion-induced effective surface modifications on InP

Journal of Nanoscience and Nanotechnology

Volumn 8, Issue 8, 2008, Pages 4163-4167

  Sulania, I ^a   Tripathi, A ^a   Kabiraj, D ^a   Varma, S ^b   Avasthi, D K ^a  

^a INTER UNIVERSITY ACCELERATOR CENTRE   (India)

^b INSTITUTE OF PHYSICS   (India)

Author keywords

Atomic force microscopy; InP; Ripple formation; Sputtering; XPS

Indexed keywords

AR ATOMS; ATOMIC FORCE MICROSCOPY; BASE PRESSURES; FLUENCE; FLUENCES; GROWTH PARAMETERS; INCIDENCE ANGLES; INP; KEV IONS; RIPPLE AMPLITUDES; RIPPLE FORMATION; RIPPLE WAVELENGTHS; ROOM TEMPERATURES; ROUGHNESS PARAMETERS; SURFACE EVOLUTIONS; SURFACE MODIFICATIONS; XPS; XPS CHARACTERIZATIONS;

ATOMIC PHYSICS; ATOMS; SURFACE DIFFUSION; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE MORPHOLOGY;

EID: 55849096301     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2008.AN13     Document Type: Conference Paper

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