Atom beam sputtering setup for growth of metal particles in silica

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 244, Issue 1, 2006, Pages 100-104

  Kabiraj, D ^a   Abhilash, S R ^a   Vanmarcke, Lionel ^b   Cinausero, Nicolas ^b   Pivin, J C ^c   Avasthi, D K ^a  

^a INTER UNIVERSITY ACCELERATOR CENTRE   (India)

^b UNIV MONTPELLIER   (France)

^c CENTRE DE CALCUL DE L INSTITUT NATIONAL DE PHYSIQUE NUCLEAIRE ET DE PHYSIQUE DES PARTICULES   (France)

Author keywords

Co sputtering; Fast atom source; Metal nanoparticles; Surface plasmon resonance

Indexed keywords

CO-SPUTTERING; FAST ATOM SOURCE; INSULATING MATRIX; METAL NANOPARTICLES;

ANNEALING; ATOMIC BEAMS; CURRENT DENSITY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; SPUTTERING; THIN FILMS;

CRYSTAL GROWTH;

EID: 33846471414     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.11.018     Document Type: Conference Paper

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