Fabrication of metal nano dot dry etching mask using block copolymer thin film

Current Applied Physics

Volumn 9, Issue 1 SUPPL., 2009, Pages

  Kang, G B ^a,b   Kim, S I ^b   Kim, Y T ^b   Park, J H ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Korea University   (South Korea)

Author keywords

Block copolymer; Nanodots; Soft lithography

Indexed keywords

ABS RESINS; ACETIC ACID; ACIDS; ALUMINUM; BLOCK COPOLYMERS; CHROMIUM; COPOLYMERIZATION; CURING; CYLINDERS (SHAPES); ELECTRON BEAM LITHOGRAPHY; ETCHING; FLUORINE; GOLD; MICROSCOPES; NICKEL; NICKEL ALLOYS; ORGANIC POLYMERS; PLASMA ETCHING; PLASTIC PRODUCTS; POLYMERS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THICK FILMS; THIN FILM DEVICES; THIN FILMS;

AL THIN FILMS; ATOMIC FORCE MICROSCOPES; COPOLYMER THIN FILMS; ETCHING MASKS; METAL NANO DOTS; NANO SIZES; NANODOTS; PERIODIC ARRAYS; PROCESS USING; PS TEMPLATES; REACTIVE IONS; SCANNING ELECTRON MICROSCOPES; SI SURFACES; SILICON SUBSTRATES; SOFT LITHOGRAPHY; UNIFORMLY DISTRIBUTED;

REACTIVE ION ETCHING;

EID: 55649104963     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2008.08.012     Document Type: Article

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