Application of spectral reflectance to the monitoring of ZnO nanorod growth

Applied Surface Science

Volumn 255, Issue 3, 2008, Pages 746-748

  Ghong, T H ^a   Kim, Y D ^a   Ahn, E ^b   Yoon, E ^b   An, S J ^c   Yi, G C ^c  

^a Kyung Hee University   (South Korea)

^b Seoul National University   (South Korea)

^c Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

In situ monitoring; Silicon; Spectral reflectance; ZnO nanorod

Indexed keywords

II-VI SEMICONDUCTORS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; REFLECTION; SAPPHIRE; SILICON; ZINC OXIDE;

CATALYST-FREE; IN- SITU MONITORING; LOW PRESSURES; MULTILAYER MODELS; SAPPHIRE SUBSTRATES; SPECTRAL REFLECTANCES; ZNO NANOROD;

NANORODS;

EID: 55649100059     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.07.048     Document Type: Article

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