On the spatial stability and bifurcation of the kirkendall plane during solid-state interdiffusion

Critical Reviews in Solid State and Materials Sciences

Volumn 33, Issue 3-4, 2008, Pages 210-233

  Kodentsov, A A ^a   Paul, A ^b   Van Dal, M J H ^c   Cserhati, Cs ^d   Gusak, A M ^e   Van Loo, F J J ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b INDIAN INSTITUTE OF SCIENCE   (India)

^c NXP TSMC Research Center   (Belgium)

^d UNIVERSITY OF DEBRECEN   (Hungary)

^e CHERKASY NATIONAL UNIVERSITY   (Ukraine)

Author keywords

Diffusion; Kirkendall effect; Kirkendall plane; Microstructure; Periodic pattern

Indexed keywords

FLOW INTERACTIONS; MORPHOLOGY; PHASE INTERFACES; PHASE TRANSITIONS; PHOTOLITHOGRAPHY; SEMICONDUCTOR DOPING;

CLASSICAL DIFFUSION THEORIES; CRYSTAL MORPHOLOGIES; DIFFUSION ZONES; DIFFUSIONAL GROWTHS; ELECTRONIC DEVICES; INERT PARTICLES; INITIAL STAGES; INTER DIFFUSIONS; INTERFACIAL REACTIONS; KIRKENDALL; KIRKENDALL EFFECT; KIRKENDALL PLANE; MORPHOLOGY CHANGES; NUCLEATION SITES; PERIODIC PATTERN; REACTION LAYERS; REACTION ZONES; REACTIVE DIFFUSIONS; SPATIAL STABILITIES;

DIFFUSION;

EID: 55549119298     PISSN: 10408436     EISSN: 15476561     Source Type: Journal    
DOI: 10.1080/10408430802462958     Document Type: Article

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