Forming carbon nanotube composites by directly coating forests with inorganic materials using low pressure chemical vapor deposition

Thin Solid Films

Volumn 517, Issue 2, 2008, Pages 525-530

  Chandrashekar, A ^a   Ramachandran, S ^b   Pollack, G ^b   Lee, J S ^c   Lee, G S ^b   Overzet, L ^b  

^a NOVELLUS SYSTEMS INC   (United States)

^b The University of Texas at Dallas   (United States)

^c Chonbuk National University   (South Korea)

Author keywords

Carbon nanostructures; Deposition process; Low pressure chemical vapor deposition; Scanning electron microscopy; X ray diffraction

Indexed keywords

CARBON; CARBON CARBON COMPOSITES; CARBON FIBER REINFORCED PLASTICS; CARBON NANOTUBES; CARBON NITRIDE; COATINGS; COMPOSITE MATERIALS; DEPOSITION; FREE VOLUME; HARDNESS; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MICROSCOPIC EXAMINATION; NANOCOMPOSITES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NANOTUBES; NITRIDES; POLYSILICON; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON NITRIDE; THICK FILMS; THICKNESS MEASUREMENT; VAPORS; VOID FRACTION;

CARBON NANOSTRUCTURES; COATING THICKNESSES; DEPOSITION PROCESS; FOREST HEIGHTS; GROWTH PROCESSES; INORGANIC MATERIALS; NANOTUBE COMPOSITES; POLYSILICON THIN FILMS; PRECURSOR GASSES; SOLID FILMS; STEP COVERAGES; X-RAY DIFFRACTION;

COMPOSITE FILMS;

COATING WEIGHT; COMPOSITES; DEPOSITION; FILLING; FORMING; GAS FLOW; POLYSILICONES; THIN FILMS;

EID: 55249089419     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.06.064     Document Type: Article

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